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Atomic magnetometry using a metasurface polarizing beamsplitter in silicon on sapphire
Authors:
Xuting Yang,
Pritha Mukherjee,
Minjeong Kim,
Hongyan Mei,
Chengyu Fang,
Soyeon Choi,
Yuhan Tong,
Sarah Perlowski,
David A. Czaplewski,
Alan M. Dibos,
Mikhail A. Kats,
Jennifer T. Choy
Abstract:
We demonstrate atomic magnetometry using a metasurface polarizing beamsplitter fabricated on a silicon-on-sapphire (SOS) platform. The metasurface splits a beam that is near-resonant with the rubidium atoms (795 nm) into orthogonal linear polarizations, enabling measurement of magnetically sensitive circular birefringence in a rubidium vapor through balanced polarimetry. We incorporated the metasu…
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We demonstrate atomic magnetometry using a metasurface polarizing beamsplitter fabricated on a silicon-on-sapphire (SOS) platform. The metasurface splits a beam that is near-resonant with the rubidium atoms (795 nm) into orthogonal linear polarizations, enabling measurement of magnetically sensitive circular birefringence in a rubidium vapor through balanced polarimetry. We incorporated the metasurface into an atomic magnetometer based on nonlinear magneto-optical rotation and measured sub-nanotesla sensitivity, which is limited by low-frequency technical noise and transmission loss through the metasurface. To our knowledge, this work represents the first demonstration of SOS nanophotonics for atom-based sensing and paves the way for highly integrated, miniaturized atomic sensors with enhanced sensitivity and portability.
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Submitted 2 April, 2024;
originally announced April 2024.
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On-chip picosecond synchrotron pulse shaper
Authors:
Jian Zhou,
Jinxing Jiang,
Donald A. Walko,
Dafei Jin,
Daniel López,
David A. Czaplewski,
Jin Wang
Abstract:
Synchrotrons are powerful and productive in revealing the spatiotemporal complexities in matter. However, X-ray pulses produced by the synchrotrons are predetermined in specific patterns and widths, limiting their operational flexibility and temporal resolution. Here, we introduce the on-chip picosecond synchrotron pulse shaper that shapes the sub-nm-wavelength hard X-ray pulses at individual beam…
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Synchrotrons are powerful and productive in revealing the spatiotemporal complexities in matter. However, X-ray pulses produced by the synchrotrons are predetermined in specific patterns and widths, limiting their operational flexibility and temporal resolution. Here, we introduce the on-chip picosecond synchrotron pulse shaper that shapes the sub-nm-wavelength hard X-ray pulses at individual beamlines, flexibly and efficiently beyond the synchrotron pulse limit. The pulse shaper is developed using the widely available silicon-on-insulator technology, oscillates in torsional motion at the same frequency or at harmonics of the storage ring, and manipulates X-ray pulses through the narrow Bragg peak of the crystalline silicon. Stable pulse manipulation is achieved by synchronizing the shaper timing to the X-ray timing using electrostatic closed-loop control. Tunable shaping windows down to 40 $ps$ are demonstrated, allowing X-ray pulse picking, streaking, and slicing in the majority of worldwide synchrotrons. The compact, on-chip shaper offers a simple but versatile approach to boost synchrotron operating flexibility and to investigate structural dynamics from condensed matter to biological systems beyond the current synchrotron-source limit.
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Submitted 27 October, 2022;
originally announced November 2022.
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Diffraction limited focusing and routing of gap plasmons by a metal-dielectric-metal lens
Authors:
Brian S. Dennis,
David A. Czaplewski,
Michael I. Haftel,
Daniel Lopez,
Girsh Blumberg,
Vladimir Aksyuk
Abstract:
Passive optical elements can play key roles in photonic applications such as plasmonic integrated circuits. Here we experimentally demonstrate passive gap-plasmon focusing and routing in two-dimensions. This is accomplished using a high numerical-aperture metal-dielectric-metal lens incorporated into a planar-waveguide device. Fabrication via metal sputtering, oxide deposition, electron- and focus…
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Passive optical elements can play key roles in photonic applications such as plasmonic integrated circuits. Here we experimentally demonstrate passive gap-plasmon focusing and routing in two-dimensions. This is accomplished using a high numerical-aperture metal-dielectric-metal lens incorporated into a planar-waveguide device. Fabrication via metal sputtering, oxide deposition, electron- and focused-ion- beam lithography, and argon ion-milling is reported on in detail. Diffraction-limited focusing is optically characterized by sampling out-coupled light with a microscope. The measured focal distance and full-width-half-maximum spot size agree well with the calculated lens performance. The surface plasmon polariton propagation length is measured by sampling light from multiple out-coupler slits.
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Submitted 30 July, 2015;
originally announced July 2015.
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Small footprint nano-mechanical plasmonic phase modulators
Authors:
V. A. Aksyuk,
B. S. Dennis,
M. I. Haftel,
D. A. Czaplewski,
D. Lopez,
G. Blumberg
Abstract:
The authors' recent Nature Photonics article titled "Compact Nano-Mechanical Plasmonic Phase Modulators" [1] is reviewed which reports a new phase modulation principle with experimental demonstration of a 23 μm long non-resonant modulator having 1.5 π rad range with 1.7 dB excess loss at 780 nm. Analysis showed that by decreasing all dimensions, a low loss, ultra-compact π rad phase modulator is p…
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The authors' recent Nature Photonics article titled "Compact Nano-Mechanical Plasmonic Phase Modulators" [1] is reviewed which reports a new phase modulation principle with experimental demonstration of a 23 μm long non-resonant modulator having 1.5 π rad range with 1.7 dB excess loss at 780 nm. Analysis showed that by decreasing all dimensions, a low loss, ultra-compact π rad phase modulator is possible. Application of this type of nano-mechanical modulator in a miniature 2 x 2 switch is suggested and an optical design numerically validated. The footprint of the switch is 0.5 μm x 2.5 μm.
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Submitted 30 July, 2015;
originally announced July 2015.
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Silicon-nitride photonic circuits interfaced with monolayer MoS$_2$
Authors:
Guohua Wei,
Teodor K. Stanev,
David A. Czaplewski,
Il Woong Jung,
Nathaniel P. Stern
Abstract:
We report on the integration of monolayer molybdenum disulphide with silicon nitride microresonators assembled by visco-elastic layer transfer techniques. Evanescent coupling from the resonator mode to the monolayer is confirmed through measurements of cavity transmission. The absorption of the monolayer semiconductor flakes in this geometry is determined to be 850 dB/cm, which is larger than that…
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We report on the integration of monolayer molybdenum disulphide with silicon nitride microresonators assembled by visco-elastic layer transfer techniques. Evanescent coupling from the resonator mode to the monolayer is confirmed through measurements of cavity transmission. The absorption of the monolayer semiconductor flakes in this geometry is determined to be 850 dB/cm, which is larger than that of graphene and black phosphorus with the same thickness. This technique can be applied to diverse monolayer semiconductors for assembling hybrid optoelectronic devices such as photodetectors and modulators operating over a wide spectral range.
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Submitted 5 June, 2015;
originally announced June 2015.
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Ultracompact Nano-Mechanical Plasmonic Phase Modulators
Authors:
Brian S. Dennis,
Michael I. Haftel,
David A. Czaplewski,
Daniel Lopez,
Girsh Blumberg,
Vladimir Aksyuk
Abstract:
Dielectrics' refractive index limits photonics miniaturization. By coupling light to metal's free electrons, plasmonic devices achieve deeper localization, which scales with the device geometric size. However, when localization approaches the skin depth, energy shifts from the dielectric into the metal, hindering active modulation. Here we propose a nano-electromechanical phase modulation principl…
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Dielectrics' refractive index limits photonics miniaturization. By coupling light to metal's free electrons, plasmonic devices achieve deeper localization, which scales with the device geometric size. However, when localization approaches the skin depth, energy shifts from the dielectric into the metal, hindering active modulation. Here we propose a nano-electromechanical phase modulation principle exploiting the extraordinarily strong dependence of the phase velocity of metal-insulator-metal(MIM) gap plasmons on dynamically variable gap size. We demonstrate a 23 μm long non-resonant modulator having 1.5 π rad range with 1.7 dB excess loss at 780 nm. Analysis shows an ultracompact 1 μm$^{2}$ footprint π rad phase modulator can be realized, more than an order of magnitude smaller than any previously shown. Remarkably, this size reduction is achieved without incurring extra loss, since the nanobeam-plasmon coupling strength increases at a similar rate as the loss. Such small, high density electrically controllable components may find applications in optical switch fabrics and reconfigurable flat plasmonic optics.
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Submitted 1 October, 2014;
originally announced October 2014.
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Experimental demonstration of near-infrared epsilon-near-zero multilayer metamaterial slabs
Authors:
Xiaodong Yang,
Changyu Hu,
Huixu Deng,
Daniel Rosenmann,
David A. Czaplewski,
Jie Gao
Abstract:
Near-infrared epsilon-near-zero (ENZ) metamaterial slabs based on silver-germanium (Ag-Ge) multilayers are experimentally demonstrated. Transmission, reflection and absorption spectra are characterized and used to determine the complex refractive indices and the effective permittivities of the ENZ metamaterial slabs, which match the results obtained from both the numerical simulations and the opti…
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Near-infrared epsilon-near-zero (ENZ) metamaterial slabs based on silver-germanium (Ag-Ge) multilayers are experimentally demonstrated. Transmission, reflection and absorption spectra are characterized and used to determine the complex refractive indices and the effective permittivities of the ENZ metamaterial slabs, which match the results obtained from both the numerical simulations and the optical nonlocalities analysis. A rapid post-annealing process is used to reduce the collision frequency of silver and therefore decrease the optical absorption loss of multilayer metamaterial slabs. Furthermore, multilayer grating structures are studied to enhance the optical transmission and also tune the location of ENZ wavelength. The demonstrated near-infrared ENZ multilayer metamaterial slabs are important for realizing many exotic applications, such as phase front shaping and engineering of photonic density of states.
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Submitted 23 September, 2013;
originally announced September 2013.
