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Jörg Schulze
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2020 – today
- 2024
- [c35]Jannik H. Schwarberg
, Robin Karhu, Birgit Kallinger, Mathias Rommel, Robin Schmidt, Jörg Schulze:
Investigation of CMOS Single Process Steps on 4H-SiC a-Plane Wafers for Quantum Applications. MIPRO 2024: 1566-1572 - [c34]Maximilian Ley, Jan F. Dick, Jörg Schulze:
Ab Initio Calculations to Determine Tunneling Parameters for 4H-SiC Tunneling Field-Effect Transistor Simulations. MIPRO 2024: 1573-1578 - 2022
- [j2]Yasmine Elogail
, Fritz Berkmann
, Caterina J. Clausen, Inga A. Fischer, Linda A. Hänel, Daniel Schwarz, Jörg Schulze:
Investigation of Ge-Based P-Channel Planar-Doped Barrier FETs integrated on Si. Microelectron. J. 123: 105404 (2022) - [c33]Lukas Seidel, Sören Schäfer, Michael Oehme, Dan Buca, Giovanni Capellini, Jörg Schulze, Daniel Schwarz
:
Electroluminescence of SixGe1-x-ySny/Ge1-ySny pin-Diodes Grown on a GeSn Buffer. ESSCIRC 2022: 165-168 - [c32]Maurice Wanitzek
, Michael Oehme, Christian Spieth, Daniel Schwarz
, Lukas Seidel, Jörg Schulze:
GeSn-on-Si Avalanche Photodiodes for Short-Wave Infrared Detection. ESSCIRC 2022: 169-172 - 2021
- [c31]Hannes S. Funk, David Weißhaupt, Daniel Schwarz
, D. Bloos, Joris van Slageren, Jörg Schulze:
Characterization of Fe Micromagnets for Semiconductor Spintronics by In-Field Magnetic Force Microscopy. MIPRO 2021: 31-35 - [c30]Fritz Berkmann
, M. Ayasse, F. Mörz, Inga A. Fischer, Jörg Schulze:
Titanium and Nickel as alternative materials for mid Infrared Plasmonic. MIPRO 2021: 36-39 - [c29]E. Sigle, David Weißhaupt, Michael Oehme, Hannes S. Funk, Daniel Schwarz
, Fritz Berkmann
, Jörg Schulze:
Strained Ge Channels with High Hole Mobility Grown on Si Substrates by Molecular Beam Epitaxy. MIPRO 2021: 40-44 - [c28]David Weißhaupt, Hannes S. Funk, Christoph Sürgers
, Gerda Fischer, Michael Oehme, Daniel Schwarz
, Inga A. Fischer, Joris van Slageren, Jörg Schulze:
Formation of Mn5Ge3 on a Recess-Etched Ge (111) Quantum-Well Structure for Semiconductor Spintronics. MIPRO 2021: 45-49 - [c27]Daniel Schwarz
, Sören Schäfer, Lukas Seidel, Hannes S. Funk, David Weißhaupt, Michael Oehme, V. Schlykow, V. Kiyek, Dan Buca, Jörg Schulze:
MBE-Grown Ge0.92Sn0.08 Diode on RPCVD-Grown Partially Relaxed Virtual Ge0.92Sn0.08 Substrate. MIPRO 2021: 50-54 - [c26]Lukas Seidel, Daniel Schwarz
, Michael Oehme, A. Causevic, Hannes S. Funk, David Weißhaupt, Fritz Berkmann
, Jörg Schulze:
Electrical Characterization of SiGeSn/Ge/GeSn-pin-Heterodiodes at Low Temperatures. MIPRO 2021: 55-59 - 2020
- [c25]Maurice Wanitzek
, Michael Oehme, Daniel Schwarz
, K. Guguieva, Jörg Schulze:
Ge-on-Si Avalanche Photodiodes for LIDAR Applications. MIPRO 2020: 8-12 - [c24]A. Causevic, Hannes S. Funk, Daniel Schwarz, K. Guguieva, Jörg Schulze:
Processing sequence for a PureB bipolar junction transistor. MIPRO 2020: 13-16 - [c23]Marco M. Dettling, David Weißhaupt, Hannes S. Funk, Michal Kern, Fritz Berkmann
, Caterina J. Clausen, Michael Oehme, Daniel Schwarz, Joris van Slageren, Jörg Schulze:
Carrier mobilities in heavily doped pseudomorphic Ge1-x Snx-epilayers. MIPRO 2020: 17-21
2010 – 2019
- 2019
- [c22]Tihomir Knezevic
, Tomislav Suligoj, Xingyu Liu, Lis K. Nanver, Ahmed Elsayed, Jan F. Dick, Jörg Schulze:
Back-end-of-line CMOS-compatible diode fabrication with pure boron deposition down to 50 °C. ESSDERC 2019: 242-245 - [c21]Ann-Christin Köllner, Zili Yu, Michael Oehme, Jens Anders, Mathias Kaschel, Jörg Schulze, Joachim N. Burghartz:
A 2x2 Pixel Array Camera based on a Backside Illuminated Ge-on-Si Photodetector. IEEE SENSORS 2019: 1-4 - [c20]Mathias C. J. Weiser, Daniel Schwarz
, Hannes S. Funk, David Weißhaupt, C. Serra, Jörg Schulze, Stefano Chiussi:
Fabrication of GePb-Alloys by Means of Pulsed Laser Induced Epitaxy. MIPRO 2019: 1-6 - [c19]P. Povolni, Daniel Schwarz
, Caterina J. Clausen, Yasmine Elogail
, Hannes S. Funk, Michael Oehme, David Weißhaupt, Jörg Schulze:
Electrical Characterization of Fabricated pin Diodes made from SixGe1-x-ySny with an Embedded Ge1-xSnx Quantum Well. MIPRO 2019: 7-12 - [c18]Lukas Gebert, Daniel Schwarz
, Asser Elsayed, Jörg Schulze:
Electrical Characterization of pure Boron-on-Germanium pin Diodes. MIPRO 2019: 13-18 - [c17]Jan F. Dick, Asser Elsayed, Daniel Schwarz
, Jörg Schulze:
Electrical Characterization of Low-Temperature Boron on Silicon Deposition utilizing Molecular Beam Epitaxy. MIPRO 2019: 19-23 - 2018
- [c16]Ahmed Elsayed, Jörg Schulze:
Characterization of thin Boron layers grown on Silicon utilizing molecular beam epitaxy for ultra-shallow pn-junctions. MIPRO 2018: 7-11 - [c15]Yuma Kawaguchi, Lion Augel
, H. Uchida, M. Inoue, Jörg Schulze, Inga A. Fischer
:
Simulation-based optimization of Ge-PIN-photodiodes with Al nanohole arrays for refractive index sensing. MIPRO 2018: 23-26 - [c14]Linda A. Hänel, Yasmine Elogail
, Daniel Schwarz
, Inga A. Fischer
, Jörg Schulze:
Performance of C6H8O7-treated and H- and Cl-passivated Ge-MOS-capacitances on Ge-virtual-substrate on Si(001). MIPRO 2018: 27-31 - [c13]Fritz Berkmann
, Lion Augel
, M. B. Schilling, Audrey Berrier
, Daniel Schwarz
, David Weißhaupt, Michael Oehme, Jörg Schulze, Inga A. Fischer
:
Optical characterization of highly n-type doped Ge0.95Sn0.05 rod antennas on Si(001) substrates. MIPRO 2018: 32-35 - 2017
- [c12]Hannes S. Funk
, J. Ng, N. Kamimura, Y.-H. Xie, Jörg Schulze:
Local growth of graphene on Cu and Cu0.88Ni0.12 foil substrates. MIPRO 2017: 31-36 - [c11]J. Schlipf
, J. L. Frieiro
, Inga A. Fischer
, C. Serra, Jörg Schulze, Stefano Chiussi:
Growth of patterned GeSn and GePb alloys by pulsed laser induced epitaxy. MIPRO 2017: 37-42 - [c10]David Weisshaupt, Pedram Jahandar, Gerard Colston, Phil Allred, Jörg Schulze, Maksym Myronov:
Impact of Sn segregation on Ge1-xSnx epi-layers growth by RP-CVD. MIPRO 2017: 43-47 - [c9]Erlend G. Rolseth, Andreas Blech, Inga A. Fischer
, Youssef Hashad, Roman Koerner, Konrad Kostecki, Aleksei Kruglov, V. S. Senthil Srinivasan, Mathias Weiser, Torsten Wendav, Kurt Busch
, Jörg Schulze:
Device performance tuning of Ge gate-all-around tunneling field effect transistors by means of GeSn: Potential and challenges. MIPRO 2017: 57-65 - 2016
- [c8]Wogong Zhang
, Michael Oehme, Klaus Matthies, Viktor Stefani, Ashraful I. Raju, Erich Kasper
, Jörg Schulze:
Small-signal IMPATT diode characterization for mm-wave power generation in monolithic scenarios. ESSDERC 2016: 109-112 - [c7]Inga A. Fischer
, Filipe Oliveira, Alessandro Benedetti, Stefano Chiussi, Jörg Schulze:
(Si)GeSn nanostructures for optoelectronic device applications. MIPRO 2016: 1-4 - 2015
- [c6]Matthias Längrich, Jörg Schulze, Amruth N. Kumar
:
Expression tasks for novice programmers: Turning the attention to objectivity, reliability and validity. FIE 2015: 1-8 - 2014
- [c5]Matthias Längrich, Jörg Schulze:
Rethinking task types for novice programmers. FIE 2014: 1-8 - 2012
- [c4]Yayun Zhou, Jörg Schulze, Stefan Schäffler:
Dual spherical spline: A new representation of ruled surface optimization. ICARCV 2012: 1193-1198 - 2011
- [c3]Yayun Zhou, Jörg Schulze, Stefan Schäffler:
Tool Path Planning in Flank Milling based on Dual Spherical Spline. GRAPP 2011: 5-12 - 2010
- [c2]Yayun Zhou, Jörg Schulze, Stefan Schäffler:
Blade geometry design with kinematic ruled surface approximation. SAC 2010: 1266-1267
2000 – 2009
- 2005
- [j1]Vanessa Capodieci, Florian Wiest, Torsten Sulima, Jörg Schulze, Ignaz Eisele:
Examination and evaluation of La2O3 as gate dielectric for sub-100nm CMOS and DRAM technology. Microelectron. Reliab. 45(5-6): 937-940 (2005) - [c1]Matthias Längrich, Antje Meyer, Jörg Schulze:
Der Funktions-Fragment-Checker: eine effektive Übungsumgebung für C#-Programmieranfänger. Leipziger Informatik-Tage 2005: 297-302
Coauthor Index
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