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"Run-to-run process control for chemical mechanical polishing in ..."

Li Da et al. (2002)

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DOI: 10.1109/ISIC.2002.1157854

access: closed

type: Conference or Workshop Paper

metadata version: 2023-07-14

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Li Da, Varadarajan Ganesh Kumar, Arthur Tay, Abdullah Al Mamun, Weng Khuen Ho, Alex See, Lap Chan:
Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing. ISIC 2002: 740-745

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