"Electromigration reliability of interconnections in RF low noise amplifier ..."

Feifei He, Cher Ming Tan (2012)

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DOI: 10.1016/J.MICROREL.2011.09.033

access: closed

type: Journal Article

metadata version: 2020-02-22

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Feifei He, Cher Ming Tan:
Electromigration reliability of interconnections in RF low noise amplifier circuit. Microelectron. Reliab. 52(2): 446-454 (2012)

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