"Electrical reliability aspects of through the gate implanted MOS ..."

Michael P. M. Jank et al. (2001)

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DOI: 10.1016/S0026-2714(01)00053-1

access: closed

type: Journal Article

metadata version: 2020-02-22

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Michael P. M. Jank, Martin Lemberger, Anton J. Bauer, Lothar Frey, Heiner Ryssel:
Electrical reliability aspects of through the gate implanted MOS structures with thin oxides. Microelectron. Reliab. 41(7): 987-990 (2001)

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