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"A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching ..."

Zai-Fa Zhou et al. (2007)

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DOI: 10.1109/TCAD.2006.882510

access: closed

type: Journal Article

metadata version: 2020-09-24

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Zai-Fa Zhou, Qing-An Huang, Wei-Hua Li, Wei Lu:
A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching Process Simulation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 26(1): 100-114 (2007)

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