"Examination of degradation mechanism due to negative bias temperature ..."

Kazufumi Watanabe et al. (2007)

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DOI: 10.1016/J.MICROREL.2006.06.001

access: closed

type: Journal Article

metadata version: 2020-10-26

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Kazufumi Watanabe, Akinobu Teramoto, Rihito Kuroda, Shigetoshi Sugawa, Tadahiro Ohmi:
Examination of degradation mechanism due to negative bias temperature stress from a perspective of hole energy for accurate lifetime prediction. Microelectron. Reliab. 47(2-3): 409-418 (2007)

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