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- research-articleSeptember 2017
An application to compare the past and present of townscapes
GCH '17: Proceedings of the Eurographics Workshop on Graphics and Cultural HeritagePages 99–102https://doi.org/10.2312/gch.20171298Townscapes change from one instance to another, and the data of change, like photos and maps, is kept and archived in museums and libraries. In this research, we focus on archived photo data and, by developing a smartphone application, provide an ...
- articleMarch 2008
Highly circular-polarized single photon generation from a single quantum dot at zero magnetic field
Microelectronics Journal (MICROJ), Volume 39, Issue 3-4Pages 327–330https://doi.org/10.1016/j.mejo.2007.07.098Origin of sharp photoluminescence lines observed from an InAlAs quantum dot was identified with the measurements of excitation-power dependences and polarization correlations, together with photon correlation measurements. Single photon emission with ...
- articleMarch 2008
Role of Cooper pairs for the generation of entangled photon pairs from single quantum dots
Microelectronics Journal (MICROJ), Volume 39, Issue 3-4Pages 344–347https://doi.org/10.1016/j.mejo.2007.07.009Generation of entangled photon pairs from semiconductor quantum dots (QDs) is highly desirable for realizing practical solid-state photon sources for quantum information processing and quantum cryptography. However, the energy splitting of exciton ...
- research-articleNovember 2006
Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCADICS), Volume 10, Issue 6Pages 802–807https://doi.org/10.1109/43.137508A three-dimensional topographical simulator PEACE (photo and electron beam lithography analyzing computer engineering system) is discussed. One of the difficulties in resist topographical simulation exists due to the three-dimensional resist development ...
- ArticleJune 2000
High sensitive negative silylation process for 193nm lithography
MNE '99: Proceedings of the 25th international conference on Microelectronic engineeringPages 485–488We have developed a negative silylation process using a new photoacid generator, which does not easily evaporate during post-exposure-bake (PEB) and a new polymer, poly(1-ethoxyethyloxystyrene(49)-t-butyloxy-carbonyloxystyrene(48)). 0.12 @m m line-and-...
- ArticleJune 2000
Highly sensitive positive surface modification resists
MNE '99: Proceedings of the 25th international conference on Microelectronic engineeringPages 475–478Polymers bearing O-acyloxime and cyclohexyl p-styrenesulfonate units were prepared. The polymers photochemically generated amine units and generated sulfonic acid moieties by thermolysis. The polymers were used as resist material which could give ...
- articleJune 2000
High sensitive negative silylation process for 193nm lithography
Microelectronic Engineering (MCEE), Volume 53, Issue 1-4Pages 485–488https://doi.org/10.1016/S0167-9317(00)00361-0We have developed a negative silylation process using a new photoacid generator, which does not easily evaporate during post-exposure-bake (PEB) and a new polymer, poly(1-ethoxyethyloxystyrene(49)-t-butyloxy-carbonyloxystyrene(48)). 0.12 @m m line-and-...
- articleJune 2000
Highly sensitive positive surface modification resists
Microelectronic Engineering (MCEE), Volume 53, Issue 1-4Pages 475–478https://doi.org/10.1016/S0167-9317(00)00359-2Polymers bearing O-acyloxime and cyclohexyl p-styrenesulfonate units were prepared. The polymers photochemically generated amine units and generated sulfonic acid moieties by thermolysis. The polymers were used as resist material which could give ...
- articleAugust 1998
A Study of Pulsatile Jet Discharged from Pipe End
Noise is generated from a flow field upstream of a shock wave periodically discharged from a pipe end. A vortex ring and an underexpanded jet are periodically formed and diffused downstream. To clarify the mechanism of the noise generation, the flow ...
- research-articleSeptember 1985
An Integrated Design Automation System for VLSI Circuits
Our Integrated Design Automation System consists of an integrated design database, automated design processors, verificationtools, and an interactive capture system. The automatic logic synthesis program, Angel, and the hierarchical layout systemChamp/...