A bayesian indicator for run-to-run performance assessment using industrail risk
Authors: 
Taki Eddine Korabi, Guiilaume Graton, El Mostafa El Adel, Mustapha Ouladsine, Jacques PinatonAuthors Info & Claims
Taki Eddine Korabi, Guiilaume Graton, El Mostafa El Adel, Mustapha Ouladsine, Jacques PinatonAuthors Info & ClaimsPages 3592 - 3602
Abstract
This paper proposes a performance indicator based on the Bayesian theory. This indicator is used for assessing the performances of Run-to-Run controllers. The indicator is calculated by analyzing four main points: the output/target error, the output dispersion, the out of tolerance (oot) rate and the industrial risk. The proposed Bayesian method has been tested on the Run-to-Run loops of a semiconductor manufacturing foundry.
References
[1]
Bode, C., B. Ko, and T. Edgar. 2004. "Run-to-Run Control and Performance Monitoring of Overlay in Semiconductor Manufacturing". Control Engineering Practice 12(7):893--900.
[2]
Boning, D. S., W. P. Moyne, T. H. Smith, J. Moyne, R. Telfeyan, A. Hurwitz, S. Shellman, and J. Tayor. 1996. "Run by Run Control of Chemical-Mechanical Polishing". IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part C 19(4):307--314.
[3]
Carlin, B. P., and T. A. Louis. 1997. "Bayes and Empirical Bayes Methods for Data Analysis". Statistics and Computing 7(2):153--154.
[4]
Chang, Y. S., I. S. Choi, and D. S. Bai. 2002. "Process Capability Indices for Skewed Populations". Quality and Reliability Engineering International 18(5):383--393.
[5]
Chen, L., M. Ma, S.-S. Jang, D. S.-H. Wang, and S. Wang. 2009. "Performance Assessment of Run-to-Run Control in Semiconductor Manufacturing Based on IMC Framework". International Journal of Production Research 47(15):4173--4199.
[6]
Del Castillo, E., and A. M. Hurwitz. 1997. "Run-to-Run Process Control: Literature Review and Extensions". Journal of Quality Technology 29(2):184--196.
[7]
Edgar, T. F., S. W. Butler, W. J. Campbell, C. Pfeiffer, C. Bode, S. B. Hwang, K. Balakrishnan, and J. Hahn. 2000. "Automatic Control in Microelectronics Manufacturing: Practices, Challenges, and Possibilities". Automatica 36(11):1567--1603.
[8]
May, G. S., and C. J. Spanos. 2006. Fundamentals of Semiconductor Manufacturing and Process Control. John Wiley & Sons, New Jersey.
[9]
Moyne, J., E. Del Castillo, and A. M. Hurwitz. 2000. Run-to-Run Control in Semiconductor Manufacturing. CRC press.
[10]
Nduhura-Munga, J., G. Rodriguez-Verjan, S. Dauzere-Peres, C. Yugma, P. Vialletelle, and J. Pinaton. 2013. "A literature Review on Sampling Techniques in Semiconductor Manufacturing". IEEE Transactions on Semiconductor Manufacturing 26(2):188--195.
[11]
Qin, S. J., G. Cherry, R. Good, J. Wang, and C. A. Harrison. 2006. "Semiconductor manufacturing process control and monitoring: A fab-wide framework". Journal of Process Control 16(3):179--191.
[12]
Spanos, C. J., H.-F. Guo, A. Miller, and J. Levine-Parrill. 1992. "Real-time Statistical Process Control Using Tool Data (Semiconductor Manufacturing)". IEEE Transactions on Semiconductor Manufacturing 5(4):308--318.
[13]
Toprac, A. J., D. J. Downey, and S. Gupta. 1999. Run-to-Run Control Process for Controlling Critical Dimensions. Google Patents. US Patent App. 09/908,390.
[14]
Wang, J., and Q. P. He. 2007. "A Bayesian Approach for Disturbance Detection and Classification and its Application to State Estimation in Run-to-Run Control". IEEE Transactions on Semiconductor Manufacturing 20(2):126--136.
[15]
Yang, L., and J. Lee. 2012. "Bayesian Belief Network-based Approach for Diagnostics and Prognostics of Semiconductor Manufacturing Systems". Robotics and Computer-Integrated Manufacturing 28(1):66--74.
Recommendations
Stakeholder Risk Assessment: An Outcome-Based Approach
Requirements engineering must manage the risks arising from project stakeholders. The Outcome-Based Stakeholder Risk Assessment Model (Obsram) provides guidance in stakeholder identification, identification of stakeholder impacts and perceptions, ...
Risk Management and Risk Assessment at ENISA: Issues and Challenges
ARES '06: Proceedings of the First International Conference on Availability, Reliability and SecurityIn this talk, the main directions followed in current and future work in the area of Risk Management and Risk Assessment at ENISA will be presented. The efforts in this area range from an initial inventory of Risk Management /Risk Assessment methods and ...
Comments
Information & Contributors
Information
Published In
Sponsors
Publisher
IEEE Press
Publication History
Published: 09 December 2018
Check for updates
Qualifiers
- Research-article
Conference
WSC '18
Sponsor:
Acceptance Rates
WSC '18 Paper Acceptance Rate 183 of 260 submissions, 70%;
Overall Acceptance Rate 3,413 of 5,075 submissions, 67%
Contributors
Other Metrics
Bibliometrics & Citations
Bibliometrics
Article Metrics
- 0Total Citations
- 15Total Downloads
- Downloads (Last 12 months)2
- Downloads (Last 6 weeks)0
Reflects downloads up to 22 Sep 2024
Other Metrics
Citations
View Options
Get Access
Login options
Check if you have access through your login credentials or your institution to get full access on this article.
Sign in