Abstract
Run-to-run (R2R) control is a form of adaptive model-based process control that can be tailored to environments where the process is discrete, dynamic, and highly unobservable; this is characteristic of processes in the semiconductor manufacturing industry. It generally has, at its roots, a rather straightforward approach to adaptive model-based control such as a first-order linear plant model with moving average weighting applied to adapt the (zeroth-order) constant term in the model. Most of the complexity of R2R control science lies and will continue to lie in extensions to support practical application of R2R control in semiconductor manufacturing facilities of the future; these extensions include support for weighting and bounding of parameters, run-time modeling of a large number of disturbance types, and incorporating prediction information such as virtual metrology and yield prediction into the control solution.
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© 2014 Springer-Verlag London
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Moyne, J. (2014). Run-to-Run Control in Semiconductor Manufacturing. In: Baillieul, J., Samad, T. (eds) Encyclopedia of Systems and Control. Springer, London. https://doi.org/10.1007/978-1-4471-5102-9_255-1
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DOI: https://doi.org/10.1007/978-1-4471-5102-9_255-1
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Publisher Name: Springer, London
Online ISBN: 978-1-4471-5102-9
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Latest
Run-to-Run Control in Semiconductor Manufacturing- Published:
- 26 September 2019
DOI: https://doi.org/10.1007/978-1-4471-5102-9_255-2
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Original
Run-to-Run Control in Semiconductor Manufacturing- Published:
- 05 November 2014
DOI: https://doi.org/10.1007/978-1-4471-5102-9_255-1