Abstract
In this article, an investigation has been carried out to determine the trap density and trap energy level using parallel conductance method for AlGaN/GaN HEMT epitaxial structure. Capacitance-Voltage (C–V) and Conductance-Voltage (G–V) measurements with frequency (1 kHz – 10 MHz) and temperature (25 and 250 °C) variations have been performed on large area Schottky pad having area 150 µm2 × 150 µm2. Two different types of traps have been observed with different time constants and densities. In the low frequency range between 1 and 10 kHz slow traps with density (2.79 × 1012–1.79 × 1013 cm−2) and time constant (~0.159 ms) at an energy level of 0.39 eV from EC have been observed whereas in the high frequency range greater than 1 MHz a continuum of ultra-fast traps has been observed with density between 1.94 × 1012 and 6.25 × 1012 cm−2 with time constant of 19.9 ns at 0.18 eV from EC is observed. It is also identified that at high temperature the time constant and trap density for ultra-fast traps has reduced whereas the density of slow traps has a significant increment with similar time constant.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Similar content being viewed by others
References
Mishra, U.K., Shen L., Kazior, T.E., Wu, Y.-F.: GaN-based RF power devices and amplifiers. Proc. IEEE. 96(2), 287–305 (February 2008). https://doi.org/10.1109/JPROC.2007.911060
Pengelly, R.S., Wood, S.M., Milligan, J.W., Sheppard, S.T., Pribble, W.L.: A review of GaN on SiC high electron-mobility power transistor and MMICs. IEEE Trans. Microw. Theory Tech. 60(6), 1764–1783 (2012). https://doi.org/10.1109/TMTT.2012.2187535
Ambacher, O., et al.: Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in n- and Ga-face AlGaN/GaN heterostructures. J. Appl. Phys. 85(6), 3222–3233 (1999). https://doi.org/10.1063/1.369664
Ibbetson, J.P., Fini, P.T., Ness, K.D., Den Baars, S.P., Speck, J.S., Mishra, U.K.: Polarization effects, surface states, and the source of electrons in AlGaN/GaN heterostructure field effect transistor. Appl. Phys. Lett. 77(2), 250–252 (2000). https://doi.org/10.1063/1.126940
Su, M., Chen, C., Rajan, S.: Prospects for the application of GaN power devices in hybrid electric vehicle drive systems. Semicond. Sci. Technol. 28, 074012 (2013). https://doi.org/10.1088/0268-1242/28/7/074012
Sharma, C., Visvkarma, A.K., Laishram, R., Malik, A., Narang, K., Vinayak, S., Singh, R.: Cumulative dose γ-irradiation effects on material properties of AlGaN/GaN hetero-structures and electrical properties of HEMT devices. Semicond. Sci. Technol. 34, 065024 (2019). Author, F., Author, S.: Title of a proceedings paper. In: Editor, F., Editor, S. (eds.) Conference 2016, LNCS, vol. 9999, pp. 1–13. Springer, Heidelberg (2016)
Raja, P.V., Nallatamby, J.-C, DasGupta, N., DasGupta, A.: Trapping effects on AlGaN/GaN HEMT characteristics. Solid State Electron. 176, art. no. 107929, 1–15 (February 2021). https://doi.org/10.1016/j.sse.2020.107929
Gassoumi, M.: Characterization of deep levels in AlGaN/GaN HEMT by FT-DLTS and current DLTS. Semiconductors 54, 1296–1303 (2020). https://doi.org/10.1134/S1063782620100127
Visvkarma, A.K., Sehra, K., Chanchal, Laishram, R., Malik, A., Sharma, S., Kumar, S., Rawal, D.S., Vinayak, S., Saxena, M.: Impact of gamma radiation on static, pulsed I-V and RF performance parameters of AlGaN/GaN HEMT. IEEE Transac. Electron Device. 69(5), 2299–2306 (2022). https://doi.org/10.1109/TED.2022.3161402
Simons, A.J., Tayarani-Najaran, M.H., Thomas, C.B.: Conductance technique measurements of the density of interface ststes between ZnS:Mn and p-silicon. J. Appl. Phys. 70(9) (1991). https://doi.org/10.1063/1.349042
Zhu, J., Ma, X., Hou, B., Chen, W., Hao, Y.: Investigation of trap states in high Al content AlGaN/GaN high electron. AIP Adv. 4(037108) (2014). https://doi.org/10.1063/1.4869020
Amir, W., Shin, J., Shin, K., Kin, J., Cho, C., Park, K., Tsutsumi, T., Sugiyama, H., Matsuzaki, H., Kim, T.: A qualitative approach for trap analysis between Al0.25Ga0.75N and GaN in high electron mobility transistors. Sci. Rep. 11 (2021). https://doi.org/10.1038/s41598-021-0176-4
Keller, S., Parish, G., Fini, P.T., Heikman, S., Chen, C.H., Zhang, N., DenBaars, S.P., Mishra, U.K., Wu, Y.F.: Metalorganic chemical vapor deposition of high mobility AlGaN/GaN heterostructures. J. Appl. Phys. 86, 5850–5857 (1999). https://doi.org/10.1063/1.371602
Khan, R., et al.: Effect of fully strained AlN nucleation layer on the AlN/SiC interface and subsequent GaN growth on 4H-SiC by MOVPE. J. Mater. Sci. Electron. 30, 18910–18918 (2019). https://doi.org/10.1007/s10854-019
Osvald, J.: Interface traps contribution to capacitance of Al2O3/(GaN)AlGaN/GaN heterostructures at low frequencies. Phys. E. 93, 238–242 (2017). https://doi.org/10.1016/j.physe.2017.06.022
Whiteside, M., Arulkumaran, S., Dikme, Y., Sandupatla, A., Ng, G.I.: Improved interfaced state density by low temperature epitaxy grown AlN for AlGaN/GaN metal-insulator –semiconductor diodes. Mater. Sci. Eng. B 267, 114707 (2020). https://doi.org/10.1016/j.mseb.2020.114707
Acknowledgment
Authors are thankful to the GaN MMIC team, Solid State Physics Laboratory, DRDO, New Delhi, India for providing the opportunity to carry out this work, and the Indian Institute of Technology, New Delhi, India for their experimental support.
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2022 The Author(s), under exclusive license to Springer Nature Switzerland AG
About this paper
Cite this paper
Chanchal et al. (2022). Investigation of Traps in AlGaN/GaN HEMT Epitaxial Structure Using Conductance Method. In: Shah, A.P., Dasgupta, S., Darji, A., Tudu, J. (eds) VLSI Design and Test. VDAT 2022. Communications in Computer and Information Science, vol 1687. Springer, Cham. https://doi.org/10.1007/978-3-031-21514-8_7
Download citation
DOI: https://doi.org/10.1007/978-3-031-21514-8_7
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-031-21513-1
Online ISBN: 978-3-031-21514-8
eBook Packages: Computer ScienceComputer Science (R0)