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Role of surface roughness in hard-x-ray emission from femtosecond-laser-produced copper plasmas

P. P. Rajeev, S. Banerjee, A. S. Sandhu, R. C. Issac, L. C. Tribedi, and G. R. Kumar
Phys. Rev. A 65, 052903 – Published 6 May 2002
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Abstract

Hard x-ray emission in the energy range of 30–300 keV from copper plasmas produced by 100-fs, 806-nm laser pulses at intensities in the range of 10151016Wcm2 is investigated. We demonstrate that surface roughness of the targets overrides the role of polarization state in the coupling of light to the plasma. We further show that surface roughness has a significant role in enhancing the x-ray emission in the above mentioned energy range.

  • Received 22 February 2001

DOI:https://doi.org/10.1103/PhysRevA.65.052903

©2002 American Physical Society

Authors & Affiliations

P. P. Rajeev, S. Banerjee*, A. S. Sandhu, R. C. Issac, L. C. Tribedi, and G. R. Kumar

  • Tata Institute of Fundamental Research, Homi Bhabha Road, Mumbai 400 005, India

  • *Present address: CUOS, University of Michigan, Ann Arbor, MI.
  • Present address: Department of Physics, University of Strathclyde, Scotland, U.K.
  • Electronic address: grk@tifr.res.in

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Issue

Vol. 65, Iss. 5 — May 2002

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