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Interfacial phonon scattering and transmission loss in >1 µm thick silicon-on-insulator thin films

Puqing Jiang, Lucas Lindsay, Xi Huang, and Yee Kan Koh
Phys. Rev. B 97, 195308 – Published 17 May 2018
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Abstract

Scattering of phonons at boundaries of a crystal (grains, surfaces, or solid/solid interfaces) is characterized by the phonon wavelength, the angle of incidence, and the interface roughness, as historically evaluated using a specularity parameter p formulated by Ziman [Electrons and Phonons (Clarendon Press, Oxford, 1960)]. This parameter was initially defined to determine the probability of a phonon specularly reflecting or diffusely scattering from the rough surface of a material. The validity of Ziman's theory as extended to solid/solid interfaces has not been previously validated. To better understand the interfacial scattering of phonons and to test the validity of Ziman's theory, we precisely measured the in-plane thermal conductivity of a series of Si films in silicon-on-insulator (SOI) wafers by time-domain thermoreflectance (TDTR) for a Si film thickness range of 1–10 μm and a temperature range of 100–300 K. The Si/SiO2 interface roughness was determined to be 0.11±0.04nm using transmission electron microscopy (TEM). Furthermore, we compared our in-plane thermal conductivity measurements to theoretical calculations that combine first-principles phonon transport with Ziman's theory. Calculations using Ziman's specularity parameter significantly overestimate values from the TDTR measurements. We attribute this discrepancy to phonon transmission through the solid/solid interface into the substrate, which is not accounted for by Ziman's theory for surfaces. The phonons that are specularly transmitted into an amorphous layer will be sufficiently randomized by the time they come back to the crystalline Si layer, the effect of which is practically equivalent to a diffuse reflection at the interface. We derive a simple expression for the specularity parameter at solid/amorphous interfaces and achieve good agreement between calculations and measurement values.

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  • Received 15 December 2017
  • Revised 21 April 2018

DOI:https://doi.org/10.1103/PhysRevB.97.195308

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Puqing Jiang1,*, Lucas Lindsay2, Xi Huang1, and Yee Kan Koh1,†

  • 1Department of Mechanical Engineering, National University of Singapore, Singapore 117576
  • 2Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

  • *Current address: Department of Mechanical Engineering, University of Colorado Boulder, CO 80309, USA.
  • mpekyk@nus.edu.sg

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Issue

Vol. 97, Iss. 19 — 15 May 2018

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Images

  • Figure 1
    Figure 1

    (a) Schematic of the TDTR setup to measure the in-plane thermal conductivity of Si films; (b) temperature profile in a 2-μm-thick SOI during TDTR measurements; (c) TEM image of the cross-section of our 5-μm-thick SOI wafer; (d) digitized Si/SiO2 interface for roughness estimation. We obtained the RMS roughness η as 0.11±0.04nm for this Si/SiO2 interface of our SOI wafer.

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  • Figure 2
    Figure 2

    In-plane thermal conductivity of Si films as a function of film thickness at 300, 150, and 100 K, measured by TDTR using different laser spot sizes (circles, w0=5.5μm; triangles, w0=11μm; and squares, w0=27μm) at 0.5 MHz.

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  • Figure 3
    Figure 3

    In-plane thermal conductivity of silicon thin films at (a) 300, (b) 150, and (c) 100 K. The solid symbols are the current measurements and the open symbols are similar measurements from the literature [17, 40]. Curves are from our first-principles calculations coupled with different specularity models: The one labeled “Diffusive” assumes totally diffuse scattering (p=0) at the interface, while the one labeled “Ziman” uses Ziman's equation [Eq. (1)] to calculate the specularity parameter pZiman, with interface roughness η=0.11nm determined from TEM images of the interface, and the other two labeled “DMM” and “Exp α” take into account phonon transmission in the specularity parameter as p=(1α)pZiman, with α being the transmission coefficient determined using DMM and from experimental measurements of phonon transmission across Si/SiO2/Al, respectively. The shaded regions account for uncertainty in the predicted Λin propagated from the uncertainty of the surface roughness η=0.11±0.04nm. The uncertainty in η makes negligible or no difference in the predicted Λin for cases “DMM” and “Diffusive.”

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  • Figure 4
    Figure 4

    (a) Transmission coefficient of phonons at the Si/SiO2 interface estimated using DMM (dashed lines) and the literature measurements of phonon transmission across the Si/SiO2/Al interfaces (solid lines) [44], which serves as a lower limit of phonon transmission from Si to SiO2. (b) The specularity parameters calculated using Ziman's formula for LA and TA branches with the incident angle of either 30° or 60°, as labeled, as a function of phonon frequency.

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