Abstract
Optical transitions in Er2O3 films grown on Si substrates by using a metal-organic chemical vapor deposition technique were investigated in a wide temperature (300 K ~ 5 K) and spectral (500 nm and 850 nm) ranges. Numerous sharp transitions corresponding to the Er3+ ionic levels, which showed Stark shifts induced by the crystal field were observed. With decreasing temperature from 300 K to 5 K, all transition peaks exhibited spectral red-shifts. We believe that such red-shift behavior is due to a change in the crystal field together with a change in the strain field induced by the film and the substrate with varying temperature. An interesting result is the total amount of red-shift at temperature between 300 K and 5 K. We found that the higher transition energy peaks show bigger red-shifts. This is because the dipole moments between the transition levels are different, which leads to different amounts of the Stark shift.
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The present research was supported by the research fund of Dankook University in 2016.
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Choi, H., Shin, Y.H. & Kim, Y. Temperature Dependence of the Stark Shifts of Er3+ Transitions in Er2O3 Thin Films on Si(001). J. Korean Phys. Soc. 76, 1092–1095 (2020). https://doi.org/10.3938/jkps.76.1092
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DOI: https://doi.org/10.3938/jkps.76.1092