... ELECTRONIC PROPERTIES OF DIAMOND-LIKE CARBON FILMS JOHN A. WOOLLAM, V. NATARAJAN, JOEL LAMB, ... more ... ELECTRONIC PROPERTIES OF DIAMOND-LIKE CARBON FILMS JOHN A. WOOLLAM, V. NATARAJAN, JOEL LAMB, A. AZIM KHAN, GEORGE BU-ABBUD, DAVID MATHINE, DAN RUBIN AND RODNEY O. DILLON ... REFERENCES 1 BA Banks and SK Rutledge, NASA Tech. ...
Silicon dioxide films (500–5,000 Å-thick) were deposited on silicon wafers and polyimide composit... more Silicon dioxide films (500–5,000 Å-thick) were deposited on silicon wafers and polyimide composite surfaces by plasma-enhanced chemical vapor deposition. The chemical reaction takes place on the surface and depends on substrate conditions and process parameters. In the present study, SiO2 films were deposited from tetraethylorthosilicate (TEOS) in the 275–400°C temperature range under the influence of a radio frequency discharge (13.56 MHz). The properties of the deposited films, such as refractive index, density, stoichiometry, and adhesion, were obtained. The deposition characteristics of the films were studied as a function of process parameters including temperature, pressure, and RF power level. Finally these TEOS-SiO2 films were found to be effective in the protection of polyimide-based composites for higher-temperature (350–400°C) applications.
Reflective surfaces for space station power generation systems are required to withstand the atom... more Reflective surfaces for space station power generation systems are required to withstand the atomic oxygen-dominated environment of near Earth orbit. Thin films of platinum and rhodium, which are corrosion resistant reflective metals, have been deposited by ion beam sputter deposition onto various substrate materials. Solar reflectances were then measured as a function of time of exposure to a RF-generated air
Reflective surfaces for space station power generation systems are required to withstand the atom... more Reflective surfaces for space station power generation systems are required to withstand the atomic oxygen-dominated environment of near Earth orbit. Thin films of platinum and rhodium, which are corrosion resistant reflective metals, have been deposited by ion beam sputter deposition onto various substrate materials. Solar reflectances were then measured as a function of time of exposure to a RF-generated air
Thin films of dielectric materials are used extensively in the semiconductor and microelectronics... more Thin films of dielectric materials are used extensively in the semiconductor and microelectronics industries, and a number of techniques are used to prepare them. Both conventional chemical vapor deposition and plasma-enhanced chemical vapor deposition of silicon dioxide, silicon nitride, and silicon oxynitride are discussed in this review. The effect of process parameters on the properties of these films is discussed.
ABSTRACT Dual-layer coatings consisting of layers of both aluminum oxide and silicon dioxide have... more ABSTRACT Dual-layer coatings consisting of layers of both aluminum oxide and silicon dioxide have been deposited by plasma-enhanced chemical vapor deposition onto polymide-based composites for thermo-oxidative protection. The silica was deposited from tetraethoxysilane, and the alumina was deposited from aluminum triisopropoxide. Deposition temperatures ranged between 573 and 598 K, and film thicknesses ranged from 100 to 200 nm. In all cases, alumina was deposited first, followed by the silica. Results indicate that such coatings improve the stability of these composites at elevated temperatures (to 673 K) for up to 300 h exposure to ambient air at 101.3 kPa (1 atm). Film systems with an alumina layer of intermediate thickness (150 nm) gave the greatest degree of resistance to thermo-oxidative mass loss (about half the mass loss rate of an uncoated control sample). Comparisons with earlier work with silica-only coatings showed the silica coating to be the best of all coatings studied, but there is considerable variation in the batch-to-batch performance of uncoated composite.
... ELECTRONIC PROPERTIES OF DIAMOND-LIKE CARBON FILMS JOHN A. WOOLLAM, V. NATARAJAN, JOEL LAMB, ... more ... ELECTRONIC PROPERTIES OF DIAMOND-LIKE CARBON FILMS JOHN A. WOOLLAM, V. NATARAJAN, JOEL LAMB, A. AZIM KHAN, GEORGE BU-ABBUD, DAVID MATHINE, DAN RUBIN AND RODNEY O. DILLON ... REFERENCES 1 BA Banks and SK Rutledge, NASA Tech. ...
Silicon dioxide films (500–5,000 Å-thick) were deposited on silicon wafers and polyimide composit... more Silicon dioxide films (500–5,000 Å-thick) were deposited on silicon wafers and polyimide composite surfaces by plasma-enhanced chemical vapor deposition. The chemical reaction takes place on the surface and depends on substrate conditions and process parameters. In the present study, SiO2 films were deposited from tetraethylorthosilicate (TEOS) in the 275–400°C temperature range under the influence of a radio frequency discharge (13.56 MHz). The properties of the deposited films, such as refractive index, density, stoichiometry, and adhesion, were obtained. The deposition characteristics of the films were studied as a function of process parameters including temperature, pressure, and RF power level. Finally these TEOS-SiO2 films were found to be effective in the protection of polyimide-based composites for higher-temperature (350–400°C) applications.
Reflective surfaces for space station power generation systems are required to withstand the atom... more Reflective surfaces for space station power generation systems are required to withstand the atomic oxygen-dominated environment of near Earth orbit. Thin films of platinum and rhodium, which are corrosion resistant reflective metals, have been deposited by ion beam sputter deposition onto various substrate materials. Solar reflectances were then measured as a function of time of exposure to a RF-generated air
Reflective surfaces for space station power generation systems are required to withstand the atom... more Reflective surfaces for space station power generation systems are required to withstand the atomic oxygen-dominated environment of near Earth orbit. Thin films of platinum and rhodium, which are corrosion resistant reflective metals, have been deposited by ion beam sputter deposition onto various substrate materials. Solar reflectances were then measured as a function of time of exposure to a RF-generated air
Thin films of dielectric materials are used extensively in the semiconductor and microelectronics... more Thin films of dielectric materials are used extensively in the semiconductor and microelectronics industries, and a number of techniques are used to prepare them. Both conventional chemical vapor deposition and plasma-enhanced chemical vapor deposition of silicon dioxide, silicon nitride, and silicon oxynitride are discussed in this review. The effect of process parameters on the properties of these films is discussed.
ABSTRACT Dual-layer coatings consisting of layers of both aluminum oxide and silicon dioxide have... more ABSTRACT Dual-layer coatings consisting of layers of both aluminum oxide and silicon dioxide have been deposited by plasma-enhanced chemical vapor deposition onto polymide-based composites for thermo-oxidative protection. The silica was deposited from tetraethoxysilane, and the alumina was deposited from aluminum triisopropoxide. Deposition temperatures ranged between 573 and 598 K, and film thicknesses ranged from 100 to 200 nm. In all cases, alumina was deposited first, followed by the silica. Results indicate that such coatings improve the stability of these composites at elevated temperatures (to 673 K) for up to 300 h exposure to ambient air at 101.3 kPa (1 atm). Film systems with an alumina layer of intermediate thickness (150 nm) gave the greatest degree of resistance to thermo-oxidative mass loss (about half the mass loss rate of an uncoated control sample). Comparisons with earlier work with silica-only coatings showed the silica coating to be the best of all coatings studied, but there is considerable variation in the batch-to-batch performance of uncoated composite.
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