PAUL MAYRHOFER is University Professor of Materials Science at the Institute of Materials Science and Technology, Technische Universiaet Wien, TU Wien, since 2012. Paul is also Guest Professor at the Central South University, Changsha, Hunan (China). He received a Ph.D. in 2001 and Habilitation in 2005 in Materials Science at the University of Leoben. His research activities focus on the development and characterization of vapor phase deposited nanostructured materials by a combination of computational and experimental material science. He has pioneered age hardening within hard ceramic thin films based on ternary nitrides and borides.
The influence of varying substrate temperature, N2 partial pressure, ion energy, and ion-to-Ti fl... more The influence of varying substrate temperature, N2 partial pressure, ion energy, and ion-to-Ti flux ratio on the texture development and mechanical properties of TiN is investigated in detail. We show that during low substrate temperature (T s = 300 °C) reactive sputtering of TiN in a mixed Ar + N2 discharge a change from 111- to 001-oriented growth occurs when increasing the ion-to-Ti ratio J i/J Ti above 2.5 while using a low ion energy E i of 30 eV. This texture change can be reversed to a 111-oriented growth by increasing the ion energy to 60 and 90 eV when using high ion-to-Ti ratios J i/J Ti of 2.5 and 9, without introducing strain. Thereby the hardness can be increased from ∼31 to 37 GPa with only minor changes in compressive stresses. Consequently, by defining the ion-to-Ti ratio and the ion energy during low substrate temperature reactive sputtering of TiN the texture development towards 111- or 001-oriented growth can be controlled. Based on previous studies and the textur...
The influence of varying substrate temperature, N2 partial pressure, ion energy, and ion-to-Ti fl... more The influence of varying substrate temperature, N2 partial pressure, ion energy, and ion-to-Ti flux ratio on the texture development and mechanical properties of TiN is investigated in detail. We show that during low substrate temperature (T s = 300 °C) reactive sputtering of TiN in a mixed Ar + N2 discharge a change from 111- to 001-oriented growth occurs when increasing the ion-to-Ti ratio J i/J Ti above 2.5 while using a low ion energy E i of 30 eV. This texture change can be reversed to a 111-oriented growth by increasing the ion energy to 60 and 90 eV when using high ion-to-Ti ratios J i/J Ti of 2.5 and 9, without introducing strain. Thereby the hardness can be increased from ∼31 to 37 GPa with only minor changes in compressive stresses. Consequently, by defining the ion-to-Ti ratio and the ion energy during low substrate temperature reactive sputtering of TiN the texture development towards 111- or 001-oriented growth can be controlled. Based on previous studies and the textur...
Uploads
Papers by Paul H Mayrhofer