In this work, the combinations of TiAl-doped diamond-like carbon (DLC) and TiAlN/TiN double-layer... more In this work, the combinations of TiAl-doped diamond-like carbon (DLC) and TiAlN/TiN double-layered films were designed to deposit on the tool steels using cathodic arc evaporation in a single process. The economic advantage in depositing the combined coating in one production scale PVD coating system is of practical importance. The TiAl-doped DLC as lubricant coatings were synthesized with TiAl-target arc sources to emit ion plasma to activate acetylene (C2H2) reactive gases. Scanning electron microscopy (SEM), micro-Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) techniques were employed to analysis the microstructure properties of TiAl-doped DLC coatings. Vicker's hardness tester was used to measure the mechanical properties of TiAl-doped DLC coatings. The results show that the microhardness of TiAl-doped DLC coatings was dependent on the ratio of I(subscript D)/I(subscript G) and sp^3/sp^2, which higher sp^3/sp^2 ratio or lower I(subscript D)/I(subscript G) ratio ...
In this study, the CrN coating was first deposited on tool steels by cathodic arc evaporation tec... more In this study, the CrN coating was first deposited on tool steels by cathodic arc evaporation technique and then this coating was subjected to oxygen glow discharge to activate the oxidation process in order to form oxide layer on the surface of the CrN coating. The varied properties of CrN coatings with or without oxidation treatment were studied in terms of hardness, adhesion, microstructure and surface morphology by using XRD, AFM, Rockwell indentation, Nano-indentation tests. The result turned out that the effect of the plasma oxidation process on the hardness of CrN coating was improved due to the oxide layer on the surface.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2003
This work attempted to implant a Cu catalyst into a TaN (500 Å)/FSG (1200 Å)/Si assembly using a ... more This work attempted to implant a Cu catalyst into a TaN (500 Å)/FSG (1200 Å)/Si assembly using a metal vapor vacuum arc ion implanter. The range of the copper dose was between 5.0×1015 and 1.0×1017 cm−2 and the accelerating voltage ranged from 30 to 50 kV. Both blanked and patterned specimens were subsequently deposited with an electroless-plated Cu film. The specimens as a whole were characterized by secondary ion mass spectrometer (SIMS), x-ray diffraction (XRD), and field emission scanning electron microscope (FESEM). The sheet resistance was measured by a four-point probe. A noticed relationship between SIMS depth profiles and the ion energy was established. The XRD spectra also showed that electroless-plated copper film possessed a strongly characteristic peak of Cu(111) preferred orientation. An excellent gap filling in a 0.2-μm-width (AR 7:1) trench/via was observed by FESEM. The sheet electric resistivity of the specimens was decreased to 1.93 μΩ cm after annealing at 500 °C...
... of all films can be affected by the film's structure, mechanical properties, and surface... more ... of all films can be affected by the film's structure, mechanical properties, and surface ... are a combined function of friction coefficient, counter materials, and film adhesion strength. ... Themicrostructure analysis indicated that a nanocomposite structure was formed, consisting of cubic ...
A compound solid lubricating film containing a MoS2 top layer deposited on DLC interlayer by UBM ... more A compound solid lubricating film containing a MoS2 top layer deposited on DLC interlayer by UBM sputtering technique was investigated for its tribological applications in humid environments. TEM, Raman and XRD analysis revealed the amorphous nature of the MoS2 film which contains only short-range order in its lattice structure. The as-deposited MoS2 compound films showed well-bonded interfaces. The MoS2, however,
In this work, the combinations of TiAl-doped diamond-like carbon (DLC) and TiAlN/TiN double-layer... more In this work, the combinations of TiAl-doped diamond-like carbon (DLC) and TiAlN/TiN double-layered films were designed to deposit on the tool steels using cathodic arc evaporation in a single process. The economic advantage in depositing the combined coating in one production scale PVD coating system is of practical importance. The TiAl-doped DLC as lubricant coatings were synthesized with TiAl-target arc sources to emit ion plasma to activate acetylene (C2H2) reactive gases. Scanning electron microscopy (SEM), micro-Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) techniques were employed to analysis the microstructure properties of TiAl-doped DLC coatings. Vicker's hardness tester was used to measure the mechanical properties of TiAl-doped DLC coatings. The results show that the microhardness of TiAl-doped DLC coatings was dependent on the ratio of I(subscript D)/I(subscript G) and sp^3/sp^2, which higher sp^3/sp^2 ratio or lower I(subscript D)/I(subscript G) ratio ...
In this study, the CrN coating was first deposited on tool steels by cathodic arc evaporation tec... more In this study, the CrN coating was first deposited on tool steels by cathodic arc evaporation technique and then this coating was subjected to oxygen glow discharge to activate the oxidation process in order to form oxide layer on the surface of the CrN coating. The varied properties of CrN coatings with or without oxidation treatment were studied in terms of hardness, adhesion, microstructure and surface morphology by using XRD, AFM, Rockwell indentation, Nano-indentation tests. The result turned out that the effect of the plasma oxidation process on the hardness of CrN coating was improved due to the oxide layer on the surface.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2003
This work attempted to implant a Cu catalyst into a TaN (500 Å)/FSG (1200 Å)/Si assembly using a ... more This work attempted to implant a Cu catalyst into a TaN (500 Å)/FSG (1200 Å)/Si assembly using a metal vapor vacuum arc ion implanter. The range of the copper dose was between 5.0×1015 and 1.0×1017 cm−2 and the accelerating voltage ranged from 30 to 50 kV. Both blanked and patterned specimens were subsequently deposited with an electroless-plated Cu film. The specimens as a whole were characterized by secondary ion mass spectrometer (SIMS), x-ray diffraction (XRD), and field emission scanning electron microscope (FESEM). The sheet resistance was measured by a four-point probe. A noticed relationship between SIMS depth profiles and the ion energy was established. The XRD spectra also showed that electroless-plated copper film possessed a strongly characteristic peak of Cu(111) preferred orientation. An excellent gap filling in a 0.2-μm-width (AR 7:1) trench/via was observed by FESEM. The sheet electric resistivity of the specimens was decreased to 1.93 μΩ cm after annealing at 500 °C...
... of all films can be affected by the film's structure, mechanical properties, and surface... more ... of all films can be affected by the film's structure, mechanical properties, and surface ... are a combined function of friction coefficient, counter materials, and film adhesion strength. ... Themicrostructure analysis indicated that a nanocomposite structure was formed, consisting of cubic ...
A compound solid lubricating film containing a MoS2 top layer deposited on DLC interlayer by UBM ... more A compound solid lubricating film containing a MoS2 top layer deposited on DLC interlayer by UBM sputtering technique was investigated for its tribological applications in humid environments. TEM, Raman and XRD analysis revealed the amorphous nature of the MoS2 film which contains only short-range order in its lattice structure. The as-deposited MoS2 compound films showed well-bonded interfaces. The MoS2, however,
Uploads
Papers by Da-Yung Wang