Site selective growth of heteroepitaxial diamond nanoislands containing single SiV centers
Abstract
We demonstrate the controlled preparation of heteroepitaxial diamond nano- and microstructures on silicon wafer based iridium films as hosts for single color centers. Our approach uses electron beam lithography followed by reactive ion etching to pattern the carbon layer formed by bias enhanced nucleation on the iridium surface. In the subsequent chemical vapor deposition process, the patterned areas evolve into regular arrays of (001) oriented diamond nano-islands with diameters of <500 nm and a height of ≈60 nm. In the islands, we identify single SiV color centers with narrow zero phonon lines down to 1 nm at room temperature.
- Publication:
-
Applied Physics Letters
- Pub Date:
- February 2016
- DOI:
- 10.1063/1.4941804
- arXiv:
- arXiv:1511.03433
- Bibcode:
- 2016ApPhL.108f3111A
- Keywords:
-
- Condensed Matter - Materials Science;
- Condensed Matter - Mesoscale and Nanoscale Physics;
- Physics - Optics;
- Quantum Physics
- E-Print:
- version 2 accepted for publication in APL