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Positron lifetime studies of Al-Si Ohmic contact formed by rapid thermal processing

Positron lifetime studies of Al-Si Ohmic contact formed by rapid thermal processing

SPIE Proceedings, 1992
nitin kulkarni
Abstract
Due to the involvement of shorter time and energy consumption, rapid thermal processing (RTP) technique finds its success in Semiconductor processing. The Al-Si ohmic contact has been formed and the effect of alloying temperatures between 450 degree(s)C and 550 degree(s)C on this contact has been studied. The nature of the contact is probed well by positron lifetime spectroscopy (PLTS). The

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