Engineering of Advanced Materials for High Magnetic Field Sensing: A Review
Abstract
:1. Introduction
2. Main Geometric Configurations of High-Field Magnetic Sensors Based on Solid-State Materials
2.1. Hall Sensors
2.2. Magnetoresistive Sensors
2.2.1. Conventional Magnetoresistance Configuration
2.2.2. Extraordinary Magnetoresistance Configuration
3. Colossal Magnetoresistance Materials
3.1. Lanthanum Manganites
3.1.1. Low-Field Magnetoresistance
3.1.2. High-Field Magnetoresistance
3.2. High-Field Magnetic Sensors Based on CMR Effect
4. Linear Magnetoresistance in Silver Chalcogenides and Narrow Bandgap Semiconductors
4.1. Magnetoresistance in Nonstoichiometric Silver Chalcogenides
4.2. Magnetoresistance in InSb
5. Single-Few-Layer Graphene
5.1. Magnetoresistance in Graphene
5.2. Magnetic Sensors Based on Graphene
6. Two-Dimensional Transition Metal Dichalcogenides
7. Summary and Outlook
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
Abbreviations
Acronym/abbreviation | Definition |
1LG | Single layer graphene |
2D | Two-dimensional |
3LG | Three-layer graphene |
AMR | Anisotropic magnetoresistance |
BP | Black phosphorus |
CMR | Colossal magnetoresistance |
EMR | Extraordinary magnetoresistance |
FET | Field-effect transistor |
GMI | Giant magnetoimpedance |
GMR | Giant magnetoresistance |
Gr | Graphene |
h-BN | hexagonal boron nitride |
HFMR | High-field magnetoresistance |
LCMO | La1−xCaxMnO3 |
LFMR | Low-field magnetoresistance |
LMR | Linear magnetoresistance |
LSMO | La1−xSrxMnyO3 |
LSMCO | La1−xSrx(Mn1−yCoy)zO3 |
MRA | Magnetoresistance anisotropy |
MTJ | Magnetic tunnel junction |
MR | Magnetoresistance |
SdHO | Shubnikov-de Haas oscillations |
SEM | Scanning electron microscopy |
PL | Parish and Littlewood model |
TEM | Transmission electron microscopy |
TMDC | Transition metal dichalcogenide |
TMR | Tunneling magnetoresistance |
TRL | Technology readiness levels |
VRH | Variable range hopping |
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Composition | Preparation Peculiarities | Temperature, K | Magnetic Field, T | Magnetoresistance Magnitude, % | Reference |
---|---|---|---|---|---|
La0.7Ca0.3MnO3 | Nano-crystalline | 4–150 | 15–47 | 80−98 | [72] |
* 150 | 47 | ~98 | |||
302 | 47 | ~68 | |||
Micro-crystalline | 4.2 | 47 | ~80 | ||
* 250 | 47 | ~92 | |||
300 | 47 | ~85 | |||
La0.59Ca0.41MnO3 | Film; Substrate: lucalox (glass ceramics) | 77 | 60 | ~95 | [75] |
294 | 60 | ~80 | |||
La0.72Ca0.28Mn0.98O3 | Film; Substrate: lucalox; gas pressure in growth chamber 3 Torr | 1.3 | 60 | 85 | [76] |
* 225 | 60 | 98 | |||
290 | 60 | 85 | |||
Film; Substrate: lucalox; gas pressure in growth chamber 7 Torr | 1.3 | 60 | 75 | ||
* 225 | 60 | 92 | |||
290 | 60 | 80 | |||
La2/3Sr1/3MnO3 | Ceramics, average size 25 nm | 10 | 5.5 | 50 | [70] |
La0.8Sr0.2MnO3 | Nano-crystalline | 4 | 47 | 85 | [54] |
* 157 | 47 | 89 | |||
300 | 47 | 70 | |||
Micro-crystalline | 4.2 | 47 | 71 | ||
* 260 | 47 | 83 | |||
300 | 47 | 78 | |||
La0.83Sr0.17MnO3 | Film; Substrate: glass ceramics; film thickness 25 nm | 77 | 20 | 81 | [56] |
* 130 | 20 | 87 | |||
294 | 20 | 31 | |||
Film; Substrate: glass ceramics; film thickness 400 nm | 77 | 20 | 53 | ||
* 230 | 20 | 71 | |||
294 | 20 | 62 | |||
La0.83Sr0.17MnO3 | Film; Substrate: lucalox (glass ceramics); film thickness 400 nm | 77 | 91.4 | 78 | [62] |
290 | 58 | 85 | |||
La0.82Sr0.18Mn1.15O3 | Film; Substrate: polycrystalline Al2O3; film thickness 360 nm; Mn excess 1.21 | 77 | 20 | 56 | [68] |
* 250 | 20 | 66 | |||
363 | 20 | 38 | |||
La0.79Sr0.21Mn1.05Co0.12O3 | Film; Substrate: polycrystalline Al2O3; Co/(La + Sr) = 0.12 | 4 | 60 | 82 | [78] |
* 220 | 60 | 83 | |||
La0.67Ba0.33MnO3 | ceramics | 4.2 | 8 | 50 | [80] |
294 | 8 | 29 | |||
La0.4Gd0.1Ca0.5MnO3 | ceramics | 5 | 10 | 60–85 | [81] |
125 | 10 | 98 | |||
La0.45Ho0.05Ca0.5MnO3 | ceramics | 130 | 8 | 18 | [82] |
La0.45Ca0.55MnO3 | Nanoparticles; average size 70 nm | 80 | 7 | 99% | [83] |
La0.5Ca0.4Li0.1MnO3 | Grain size 5–10 μm | 5 | 14 | 82 | [84] |
300 | 14 | 30 |
Number of Graphene Layers | Substrate; Preparation Peculiarities | Temperature, K | Magnetic Field, T | Magnetoresistance Magnitude, % | Reference |
---|---|---|---|---|---|
1 | SiO2; exfoliation from Kish graphite | 300 | 9 | 200 | [123] |
4 | SiO2, wet transfer | 300 | 6 | 27 | [129] |
SiO2, wet transfer; surface decoration with Co particles | 36 | ||||
4 | SiO2; mechanically peeling Kish graphite and transfer on SiO2 | 400 | 9 | 330 | [132] |
1 | SiC; growth by thermal sublimation of substrate; change of annealing time | 300 | 9 | 40–80 | [122] |
SiC; growth by thermal sublimation of substrate | 2 | 100 | |||
multilayer | Grown on SiC | 300 | 9 | 80 | [120] |
4.2 | 12 | 250 | |||
2 | SiC; hydrogen intercalation | 300 | 62 | 90 | [128] |
1 | Polycrystalline Al2O3; wet transfer | 300 | 9 | 160 | [12] |
20 | 450 | ||||
3 | 9 | 325 | |||
20 | 760 | ||||
1 | Black phosphorus (BP); dry transfer | 300 | 9 | 780 | [123] |
4 | Boron nitride (BN); mechanical peeling of Kish graphite and transfer on BN | 400 | 10 | 900 | [132] |
6 | 2000 | ||||
2 | 12 | 6000 | |||
1 | SrTiO3; laminating on terraced substrate | 300 | 9 | 5000 | [124] |
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Žurauskienė, N. Engineering of Advanced Materials for High Magnetic Field Sensing: A Review. Sensors 2023, 23, 2939. https://doi.org/10.3390/s23062939
Žurauskienė N. Engineering of Advanced Materials for High Magnetic Field Sensing: A Review. Sensors. 2023; 23(6):2939. https://doi.org/10.3390/s23062939
Chicago/Turabian StyleŽurauskienė, Nerija. 2023. "Engineering of Advanced Materials for High Magnetic Field Sensing: A Review" Sensors 23, no. 6: 2939. https://doi.org/10.3390/s23062939