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Physics

Electron physics

News and Updates

Projects and Programs

EUV Relectivity

Metrology for extreme ultraviolet lithography

Ongoing
Patterning with light 13 nm brings a host a new challenges Light at 13 nm is well within the vacuum ultraviolet, where radiation is strongly absorbed by all materials. This requires that the technology take place in vacuum and rely on mirrors rather than lenses. Moreover generating sufficient
EUV optics degradation in space

Degradation of extreme-ultraviolet optics

Ongoing
The primary degradation process in EUVL tools and satellite instruments begins by the adsorption of water or carbonaceous molecules from the vacuum environment onto the optic surface. The optic is damaged if the molecule undergoes photon-stimulated decomposition before it can (reversibly) thermally

Precision Measurement Grants Program

Ongoing
If funding is available, two new grants in the amount of $50,000 per year will be awarded for the initial period of October 1 through September 30 of the following year. Each award may be continued for up to two additional years; however, future or continued funding will be at the discretion of NIST
Reflectance of two materials

Extreme ultraviolet optical constants

Ongoing
Measurements of EUV optical constants are often made by measuring the absorption or near-normal-incidence reflectivity, then performing transforms to obtain both the real and imaginary parts of the index. These sorts of measurements have considerable uncertainty because they require knowledge of

Publications

Statistical study and parallelization of multiplexed single-electron sources

Author(s)
S Norimoto, P See, N Schoinas, I Rungger, Tommy Boykin, Michael Stewart, J. P. Griffiths, C. Chen, D. A. Ritchie, M. Kataoka
Increasing electric current from a single-electron source is a main challenge in an effort to establish the standard of the ampere defined by the fixed value of

Software

HolograFREE

An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines

Tools and Instruments

Beamline 7

Beamline 7: EUV reflectometry

The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then