★★Electron RF Linacs for Industrial Applications - ICABU11 - 17 - 포스텍
★★Electron RF Linacs for Industrial Applications - ICABU11 - 17 - 포스텍
★★Electron RF Linacs for Industrial Applications - ICABU11 - 17 - 포스텍
S. H. Kim1)#, H. R. Yang1), M. H. Cho1,2), W. Namkung1,2), Y. G. Son2), S. D. Jang2), S. J. Kwon2), S. J. Park2), J. S. Oh3), K. O. Lee4), and K. H. Chung4)
1) Department of Physics, POSTECH 2) Pohang Accelerator Laboratory, POSTECH 3) National Fusion Research Institute 4) Korea Accelerator and Plasma Research Association
The 15th International Conference on Accelerator and Beam Utilization (ICABU11) 2011. 9. 30. Gyeongju TEMF Hotel, Gyeongju, Korea
* Work partly supported by MKE, Korea and POSTECH BK21 Program # khan777@postech.ac.kr 1/32
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
Contents
Introduction
Industrial applications of electron RF linacs
Summary
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11 2/32
Introduction
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
3/32
Introduction
Cargo Inspection
Re-locatable vehicle inspection and images by dual energy e-beam (Smiths Detection) Mobile vehicle inspection with 2.5 MeV e-beam (Tsinghua Tongfang)
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11 4/32
Introduction
Radiotherapy
Introduction
L-band
C-band
Radiotherapy (6 9 MeV, < 1 kW)
More Compact
X-band
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
6/32
L-band: Overview
E-beam scanner
L-band 1.3-GHz, 25-MW pk, 60-kW avg. Klystron with pulse tank
7/32
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
L-band: Overview
PAL/POSTECH 2007/3/23
2 MeV 5 MeV
10 MeV
Double
L-band: Overview
Cooling Stand
RF Driver
Klystron
Vacuum Gauge Controller IP Controller ATT Load Beam Diagnostics System
RF Window IP
RF Window
IP
E-Gun
IP PGV IP Controller Vacuum Gauge Controller
PB
Accelerating Column
Temperature Controller
PB: Pre-buncher IP: Ion Pump PGV: Pneumatic Gate Valve PS: Phase Shifter ATT: Attenuator BEM: Beam Energy Monitor BCM: Beam Current Monitor
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
9/32
L-band: Design
Accelerator Parameter
RF System Parameter Operating Frequency Pulsed RF Power Pulse Length Repetition Rate Average RF Power E-gun Parameter High Voltage Pulsed Beam Current Pulse Length - 80 kV 1.6 A 6 s 1.3 GHz 25 MW 7 s 350 Hz 60 kW Beam Energy Pulsed Beam Current Beam Transmission Rate Average Beam Power Accelerating Structure Parameter Type of Structure Shape of Cell Operating Mode RF Filling Time Operating Temperature Average Accelerating Gradients Beam Loading Factor Temperature Shift Factor
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
Beam Parameter 10 MeV 1.45 A 90% 30 kW Constantimpedance Disk-loaded 2/3 mode 0.8 s 40C 1C 4.2 MV/m - 4.7 MeV/A - 2.3 MeV/C
10/32
L-band: Design
0-mode
-mode
Cell Parameters
Cavity 1st buncher 2nd buncher 3rd buncher 4th buncher 5th buncher Normal Phase velocity/ c 0.65 0.75 0.88 0.92 0.98 1.00 Group velocity/ c 0.0170 0.0167 0.0165 0.0164 0.0163 0.0089 Attenuation coefficient (Neper/m) 0.0538 0.0489 0.0442 0.0431 0.0415 0.0756
Tapered W/G W/G to Coax adapter Network analyzer (Agilent E8362B)
/3mode
2/3mode
Coupler cells
z 2 (wp / 2 )
Shorting bar
2
z 2 (wm )
j (wm )
j (wp / 2 ) j (w2p / 3 )
z1 (w )
z 2 (w2p / 3 )
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
11/32
L-band: Design
10
15
20
25
30
35
RF Transmission
Cavity Cell Number Output
Cumulative phase shift for per cell relative to No.0
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
12/32
L-band: Design
8 4 0 -4 -8
50
100
150
200
250
300
30 25 20 15 10 5 0 0 100
Beam Envelope
Aperture Limitation
Beam Envelope
200
300
400
500
* Calculated by the PARMELA code with RF profiles from the SUPERFISH code
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
L-band: Design
Accelerating column
Waterload
BCM PGV
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11 14/32
L-band: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
15/32
L-band: Design
REOLC DTAIL
6:1 Heater TR
1:13 Pulse TR
RTAIL
Peak forward voltage Peak forward current Average anode current 50 kV max 15 kA max 15 A max
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
L-band: Commissioning
246.4 A
PFN voltage
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
17/32
L-band: Commissioning
Beam Acceleration
RF and beam pulsed waveform
Dose distribution in scanning direction ` 5 Absorbed dose (kGy) 4 3 2 1 0 0 10 20 Distance (cm) 30 40
18.5 MW
Input RF power
Output RF power
6 s 1.5 A 1.3 A
` Deposit dose (A.U.)
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
18/32
L-band: Commissioning
Commissioning Status
16
Parameters
RF frequency Input RF power Pulse length Repetition rate E-gun HV Pulsed beam current Beam energy Beam power E-gun pressure ACC pressure
1st Machine
1.3 GHz 12 MW 8 s/ 7 s 183 Hz 75 kV 1.1 A ~ 9 MeV 13 kW < 310-8 Torr < 10-7 Torr
2nd Machine
1.3 GHz 12 MW 7 s/ 6 s 350 Hz 66 kV 1.1 A
~ 9 MeV
Beam power
Transmitted RF power
0.8 1.0 1.2 1.4
Pohang Busan
C-band: Overview
Magnetron
Peak 1.5 MW, Average 1.2 kW max. Circulator w/ Matched Load RF Window
Temperature Controller
Ion Pump
X-ray Target
E-Gun
Collimator
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
21/32
C-band: Overview
C-band: Design
Accelerator Parameter
RF System Parameters Operating Frequency Pulsed RF Power Pulse Length Repetition Rate E-gun Parameters High Voltage Pulsed Input Beam Current Beam Diameter (at the waist) 20 kV 150 mA 4 mm 5 GHz (C-band) 1.5 MW 4 s Max. 200 Hz Species Pulsed Output Current Output Energy Loss Beam Power Ratio Accelerating Structure Parameters Type of Structure Operating Mode Number of Cells Size Beam Aperture Diameter Accelerating Gradients Q-factor Effective Shunt Impedance Inter-cell Coupling Constant
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
Beam Parameters Electron 50 mA 4 MeV @ 50 mA 6% Bi-periodic On-axis Coupled SW /2 mode 10 7.4 cm 30.7 cm 10 mm 13.3 MV/m 11000 90 M/m 6%
23/32
C-band: Design
Accelerating Structure
Tapered W/G
RF input coupler
Type: Biperiodic, On-axis-coupled, /2-mode SW structure Normal cells 6 cells 30 mm ph = 1 ph Number of cells: 10 Length: 306 mm Inner diameter: ~48 mm Beam aperture diameter: 10 mm
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
24/32
C-band: Design
Accelerating Cavity
Simulation of accelerating cavity
Frequency (MHz)
5100 5050 5000 4950 4900 4850 4800 0.0 0.2 0.4 0.6 0.8 1.0
Prototype test
Phase advance /
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
25/32
C-band: Design
Network analyzer
Step motor
Cavity
Tuning jig
Reflection coefficient
In Smith Chart
Resonant frequency
After brazing: 4998.86 MHz (20) After tuning: 4999.46 MHz (20) (*in air with humidity of 25%) Under vacuum: 4999.17 MHz (40)
C-band: Design
CPI SFD369
Frequency 5100 MHz Output Pow er 1.5 MW Re petiton Ra te 200 pps Effic ieccy 52 % Be am Voltage 39 kV Be am Current 83 A RF P ulse Width 4.0 ms
Anode
7 Stage PFN
EOLC 30 W 1 0 nF
Electron GU N
10 mH
E2 E2-1 CT-2
E4
E4-1
G2 G1
1 nF
50 W
Resistor Divider Surge Tail Des piker Clipper High Voltage Coaxial Cable P1
Resistor Divider
HV Pr obe M3 M1
BNC-1
B NC -2
B NC-3
BNC -4
E1
E3
He ater voltage : 9 V+/_ 1 V(Max: 10 V), 1 0 A Magnetron Beam Voltage Monitor Magnetron B eam Cur rent Monitor
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
27/32
C-band: Commissioning
Modulator Pulse TR & RF Source System
Magnetron Test
PLC
CCPS
90
90 80
80 70 60 50 40 30 20 10 0 24 26 28 30 32 34 36 38 40
RF output*50
70 60
Efficiency
50 40 30
PFN
Magnetron Current
20 10 0
Heater P.S
C-band: Commissioning
1500 1350 1200 1050 900 750 600 450 300 150 0 0 5 10
RF aging history
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
29/32
C-band: Commissioning
Beam Acceleration
Beam Parameters
Operating Frequency Pulsed RF Power Pulse Length Beam Energy Pulsed Beam Current Beam Spot Size (measured at 40 cm after the end of accelerating column) 5 GHz 1.5 MW 4 s 3.5 ~ 4.0 MeV 50 mA / 150 mA
Gate valve
Beam measurement
BCT
13 ~ 14 mm
C-band: Design
C-band: Design
Previous
5 GHz 1.5 MW 20 kV 10 30 cm 150 mA 4 MeV 50 mA 10 mm 13.3 MV/m 5 mm
New
5 GHz 1.5 MW 20 kV 17 48 cm 150 mA 6 MeV 80 mA 8 mm 13.8 MV/m 1.3 mm
Beam dynamics simulation for new accelerating column (by PARMELA code)
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
32/32
Summary
PAL/POSTECH developed electron RF linacs for industrial applications. L-band accelerator was installed at ACEP/KAPRA and now serves electron beams to processing users. The beam power reaches to almost 20 kW. C-band accelerator was commissioned for X-ray imaging sources. In order to increase the beam energy, new accelerating column is being designed adopting RF focusing scheme.
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
33/32
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU11
34/32