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    Micro Machining

    Uploaded by

    Chandana Kota
    The document discusses various microfabrication techniques used to create 3D structures on the micrometer scale, primarily focusing on photolithography and etching. Photolithography involves spin coating a wafer with photoresist, exposing it to light through a mask, and developing it to selectively remove either exposed or unexposed areas. Etching is then used to remove material from the wafer in open areas, with wet etching being isotropic or anisotropic and dry etching using plasma. Other microfabrication techniques discussed include bulk micromachining, laser ablation, and their applications in MEMS manufacturing.

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    Micro Machining

    Uploaded by

    Chandana Kota
    124 views18 pages
    The document discusses various microfabrication techniques used to create 3D structures on the micrometer scale, primarily focusing on photolithography and etching. Photolithography involves spin coating a wafer with photoresist, exposing it to light through a mask, and developing it to selectively remove either exposed or unexposed areas. Etching is then used to remove material from the wafer in open areas, with wet etching being isotropic or anisotropic and dry etching using plasma. Other microfabrication techniques discussed include bulk micromachining, laser ablation, and their applications in MEMS manufacturing.

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    The document discusses various microfabrication techniques used to create 3D structures on the micrometer scale, primarily focusing on photolithography and etching. Photolithography involves spin coating a wafer with photoresist, exposing it to light through a mask, and developing it to selectively remove either exposed or unexposed areas. Etching is then used to remove material from the wafer in open areas, with wet etching being isotropic or anisotropic and dry etching using plasma. Other microfabrication techniques discussed include bulk micromachining, laser ablation, and their applications in MEMS manufacturing.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PPTX, PDF, TXT or read online from Scribd
    Download as pptx, pdf, or txt
    124 views18 pages

    Micro Machining

    Uploaded by

    Chandana Kota
    The document discusses various microfabrication techniques used to create 3D structures on the micrometer scale, primarily focusing on photolithography and etching. Photolithography involves spin coating a wafer with photoresist, exposing it to light through a mask, and developing it to selectively remove either exposed or unexposed areas. Etching is then used to remove material from the wafer in open areas, with wet etching being isotropic or anisotropic and dry etching using plasma. Other microfabrication techniques discussed include bulk micromachining, laser ablation, and their applications in MEMS manufacturing.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PPTX, PDF, TXT or read online from Scribd
    Download as pptx, pdf, or txt
    of 18

    Refers to techniques for fabrication of 3D structures on the micrometer scale Most methods use silicon as substrate material Some

    of process involved in this are photolithography, etching, bulk machining, laser machining etc. Unit metal removal rate and equipment precision are key factors to micro machining.

    The wafers are chemically cleaned to remove particulate matter, organic, ionic, and metallic impurities High-speed centrifugal whirling of silicon wafers known as "Spin Coating" produces a thin uniform layer of photo resist (a light sensitive polymer) on the wafers. Photoresist is exposed to a set of lights through a mask often made of quartz Two types of photoresist are used: Positive: whatever shows, goes Negative: whatever shows, stays

    Negative and Positive Photoresists


    Photoresist Substrate UV light

    Mask/reticle Photoresist

    Substrate
    Negative Photoresist Substrate Positive Photoresist Substrate

    Exposure

    After Development

    Etching is used in micro fabrication to chemically remove layers from the surface of a wafer during manufacturing. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photo resist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride. These are of two types. They are 1)dry etching 2)wet etching In wet etching these are of two types 1)isotropic 2)anisotropic

    WET ETCHING: The wafer can be immersed in a bath of etchant, which must be agitated to achieve good process control. For instance, buffered hydrofluoric acid (BHF) is used commonly to etch silicon dioxide over a silicon substrate. A perfectly isotropic etch produces round sidewalls. A perfectly anisotropic etch produces vertical sidewalls. Red: masking layer; yellow: layer to be removed Anisotropic wet etching: Some wet etchants etch crystalline materials at very different rates depending upon which crystal face is exposed.

    DRY ETCHING:

    Modern VLSI processes avoid wet etching, and use plasma etching instead. The plasma produces energetic free radicals, neutrally charged, that react at the surface of the wafer. Since neutral particles attack the wafer from all angles, this process is isotropic. In this plasma contains a source gas which are rich in chlorine and fluorine such as carbontetraflouride in between electrodes and the wafer is etched.

    Uses anisotropic etching of single crystal silicon Bulk micromachining is a process used to produce micro machinery or microelectromechanical systems (MEMS). Common chemicals used in anisotropic etching processes are: Potassium hydroxide (KOH)/H2O solutions, sometimes with ispropyl alcohol (IPA) additive at 65-85CEthylene diamine pyrocatechol (EDP), diluted with water at 115C Tetra methyl ammonium hydroxide (TMAH) and water at 90C Hydrazine N2H4/H2O/IPA at 115C

    High-power laser pulses are used to evaporate matter from a target surface A supersonic jet of particles (plume) is ejected normal to the target surface which condenses on substrate opposite to target. The ablation process takes place in a vacuum chamber- either in vacuum or in the presence of some background gas Excimer and Femto lasers are power source in this techniques When high intensity laser is incident on the work piece it will remove the material by vaporization

    Highly flexible. Few processing steps. Capable serial or batch mode production. High quality products are produced. Good surface finish. Applicable to any type of material like polymer, glasses, crystals. Material removal rate is minimum which is main advantage for the machining at micrometer scale. Ability to machine flat and contoured surfaces.

    Expensive equipment required in laser micro machining Surface ripples due to shock waves are formed in laser micromachining. Maintaining of high quality and high accuracy is difficult Maintaining high pressure, high degrees of thermal variability makes micromachining costly There is high potential radiation damage on the surface of wafer in bulk machining.

    Manufacturing of MEMS parts. In Biochip manufacture using laser machining. Laser ablation is commonly used for patterning thin films to produce small features or isolate regions within a device. Applications of laser ablation of thin films includes production of photovolatic cells. Drilling fine pitch vertical probe cards for semiconductor testing. Laser machining of the holes in fuel injector nozzles guarantees accuracy and high quality .

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