Mr. Richard Housley Profile

Richard Housley

at Micron Technology Inc

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Author

Publications (6)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced processing control for wafer-to-wafer hybrid bonding

Nikhil Aditya Kumar Roy, Richard Housley, Dan Engelhard, Hao Wang, Cassie Bayless, Chris Nguyen, Franz Zach, Shubham Badjate, Abhishek Gottipati, Yoav Grauer, Oren Ben-Nun, Roie Volkovich

Proceedings Volume 12955, 129551Q (2024) https://doi.org/10.1117/12.3010036

KEYWORDS: Wafer bonding, Overlay metrology, Semiconducting wafers, Process control, Metrology, 3D metrology, Optical parametric oscillators, Advanced process control, 3D acquisition, Distortion

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Proceedings Article | 10 April 2024 Presentation + Paper

Small pitch overlay imaging metrology targets for tight OPO control

Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, Yonglei Li

Proceedings Volume 12955, 129551V (2024) https://doi.org/10.1117/12.3009769

KEYWORDS: Overlay metrology, Semiconducting wafers, Light sources and illumination, Metrology, Imaging metrology

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Robustness improvement in imaging-based overlay metrology for high topography layers by Talbot targets

Brian Watson, Shlomit Katz, Richard Housley, Kar Wui Thong, Nikhil Aditya Kumar Roy, Yoav Grauer, Diana Shapirov, Raviv Yohanan, Greg Gray, Yonglei Li, Daniel Chalom

Proceedings Volume 11611, 1161133 (2021) https://doi.org/10.1117/12.2583831

KEYWORDS: Metrology, Optical parametric oscillators, Overlay metrology, Imaging metrology, 3D metrology, 3D acquisition

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Proceedings Article | 22 February 2021 Presentation + Paper

Novel diffraction-based overlay metrology utilizing phase-based overlay for improved robustness

Masazumi Matsunobu, Toshiharu Nishiyama, Michio Inoue, Richard Housley, Cornel Bozdog, Justin Lim, Brian Watson, Jason Reece, Steve McCandless, Olger Zwier, Maurits van der Schaar, Murat Bozkurt, Masudur al Arif, Elliott McNamara, Pieter Kapel, Alan Khan, Simon Strom, Paul Turner, Ping Olson, Ewoud van West

Proceedings Volume 11611, 1161126 (2021) https://doi.org/10.1117/12.2584759

KEYWORDS: Overlay metrology, Diffraction, Diffraction gratings, Semiconducting wafers

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Proceedings Article | 26 March 2007 Paper

Process margin improvement using custom transmission EAPSM reticles

J. Buntin, S. Agarwal, B. Rolfson, R. Housley, B. Baggenstoss, E. Byers, C. Progler

Proceedings Volume 6520, 65202D (2007) https://doi.org/10.1117/12.712368

KEYWORDS: Reticles, Resolution enhancement technologies, Image transmission, Nano opto mechanical systems, Semiconducting wafers, Image processing, 193nm lithography, Etching, Lithography, Databases

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Proceedings Article | 29 March 2006 Paper

Selection and evaluation of developer-soluble topcoat for 193nm immersion lithography

Yayi Wei, K. Petrillo, S. Brandl, F. Goodwin, P. Benson, R. Housley, U. Okoroanyanwu

Proceedings Volume 6153, 615306 (2006) https://doi.org/10.1117/12.655725

KEYWORDS: Semiconducting wafers, Photomasks, Immersion lithography, Photoresist processing, Line edge roughness, Lithography, Temperature metrology, Particles, Scanners, Head

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Showing 5 of 6 publications

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