Condensed Matter > Mesoscale and Nanoscale Physics
[Submitted on 31 Jul 2012 (v1), last revised 2 Aug 2012 (this version, v2)]
Title:Sub-10 nm colloidal lithography for integrated spin-photo-electronic devices
View PDFAbstract:Colloidal lithography [1] is how patterns are reproduced in a variety of natural systems and is used more and more as an efficient fabrication tool in bio-, opto-, and nano-technology. Nanoparticles in the colloid are made to form a mask on a given material surface, which can then be transferred via etching into nano-structures of various sizes, shapes, and patterns [2,3]. Such nanostructures can be used in biology for detecting proteins [4] and DNA [5,6], for producing artificial crystals in photonics [7,8] and GHz oscillators in spin-electronics [9-14]. Scaling of colloidal patterning down to 10-nm and below, dimensions comparable or smaller than the main relaxation lengths in the relevant materials, including metals, is expected to enable a variety of new ballistic transport and photonic devices, such as spin-flip THz lasers [15]. In this work we extend the practice of colloidal lithography to producing large-area, near-ballistic-injection, sub-10 nm point-contact arrays and demonstrate their integration in to spin-photo-electronic devices.
Submission history
From: Vladislav Korenivski [view email][v1] Tue, 31 Jul 2012 19:57:30 UTC (1,181 KB)
[v2] Thu, 2 Aug 2012 16:34:00 UTC (3,672 KB)
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