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"Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography."

Omid T. Ghalehbeygi et al. (2018)

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DOI: 10.23919/ACC.2018.8431550

access: closed

type: Conference or Workshop Paper

metadata version: 2019-09-25

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  dblp key:
  - conf/amcc/GhalehbeygiORF18
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Omid T. Ghalehbeygi, John O'Connor, Ben S. Routley, Andrew J. Fleming:
Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography. ACC 2018: 6684-6689

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