"An IEC 61499 based run-to-run controller for chemical mechanical ..."

Kiah Mok Goh et al. (2008)

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DOI: 10.1109/ETFA.2008.4638364

access: closed

type: Conference or Workshop Paper

metadata version: 2017-06-02

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Kiah Mok Goh, Benny Tjahjono, Abdul Manaf, Anton J. R. Aendenroomer:
An IEC 61499 based run-to-run controller for chemical mechanical planarization process. ETFA 2008: 25-28

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