"Exploring the Antecedents of Technostress and Compulsive Mobile ..."

Kuo-Lun Hsiao et al. (2016)

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DOI: 10.1007/978-3-319-39943-0_31

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-24

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  - conf/hci/HsiaoLCW16
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Kuo-Lun Hsiao, Chun-Hsiung Lee, Hsiu-Sen Chiang, Ju-Yun Wang:
Exploring the Antecedents of Technostress and Compulsive Mobile Application Usage: Personality Perspectives. HCI (24) 2016: 320-328

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