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"Aluminum-photoresist dual-layer lift-off process for gold micropattern ..."

Yaoping Liu et al. (2010)

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DOI: 10.1109/NEMS.2010.5592215

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-02

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Yaoping Liu, Wei Wang, Chun Yang, Zhihong Li:
Aluminum-photoresist dual-layer lift-off process for gold micropattern preparation in cellular researches. NEMS 2010: 297-300

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