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"Next-generation lithography for 22 and 16 nm technology nodes and beyond."

Banqiu Wu (2011)

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DOI: 10.1007/S11432-011-4227-6

access: closed

type: Journal Article

metadata version: 2020-03-02

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Banqiu Wu:
Next-generation lithography for 22 and 16 nm technology nodes and beyond. Sci. China Inf. Sci. 54(5): 959-979 (2011)

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