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"Comprehensive study on the TID effects of 0.13 μm partially depleted ..."
Bingxu Ning et al. (2013)
- Bingxu Ning, Dawei Bi, Huixiang Huang, Zhengxuan Zhang, Ming Chen, Shichang Zou:
Comprehensive study on the TID effects of 0.13 μm partially depleted SOI NMOSFETs. Microelectron. J. 44(2): 86-93 (2013)
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