"Investigation on NBTI-induced dynamic variability in nanoscale CMOS ..."

Shaofeng Guo et al. (2018)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2017.11.028

access: closed

type: Journal Article

metadata version: 2024-06-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/GuoWRLLJWH18
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/GuoWRLLJWH18
Shaofeng Guo, Runsheng Wang, Pengpeng Ren, Changze Liu, Mulong Luo, Xiaobo Jiang, Yangyuan Wang, Ru Huang:
Investigation on NBTI-induced dynamic variability in nanoscale CMOS devices: Modeling, experimental evidence, and impact on circuits. Microelectron. Reliab. 81: 101-111 (2018)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.