"Accurate lifetime prediction for channel hot carrier stress on sub-1 nm ..."

Weichun Luo et al. (2016)

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DOI: 10.1016/J.MICROREL.2016.03.008

access: closed

type: Journal Article

metadata version: 2023-03-21

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Weichun Luo, Hong Yang, Wenwu Wang, Yefeng Xu, Bo Tang, Shangqing Ren, Hao Xu, Yanrong Wang, Luwei Qi, Jiang Yan, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye:
Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer. Microelectron. Reliab. 62: 70-73 (2016)

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