"A 40-nm 16-Mb Contact-Programming Mask ROM Using Dual Trench Isolation ..."

Yong Ye et al. (2016)

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DOI: 10.1109/TVLSI.2015.2449670

access: closed

type: Journal Article

metadata version: 2020-03-11

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Yong Ye, Yong Kang, Chao Zhang, Yipeng Chan, Hanming Wu, Shiuhwuu Lee, Zhitang Song, Bomy Chen:
A 40-nm 16-Mb Contact-Programming Mask ROM Using Dual Trench Isolation Diode Bitcell. IEEE Trans. Very Large Scale Integr. Syst. 24(4): 1333-1341 (2016)

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