MLCAD

It is our great pleasure to welcome you to the 2nd ACM/IEEE Workshop on Machine Learning for CAD (MLCAD 2020).

The MLCAD workshop focuses on Machine Learning (ML) methods for all aspects of CAD and electronic system design. The predecessor of this workshop series was held at the Design, Automation and Test in Europe (DATE) Conference in March 2019, followed by the inaugural regular workshop in Banff, Canada, in September 2019.

Advances in ML over the past half-dozen years have revolutionized the effectiveness of ML for a variety of applications. However, design processes present challenges that require parallel advances in ML and CAD as compared to traditional ML applications such as image classification. As such, the purpose of the workshop is to discuss, define and provide a roadmap for the special needs for ML for CAD where CAD is broadly defined as design-time techniques as well as runtime techniques.

MLCAD 2020 will be virtual, and will feature contributions from industry including tool vendors as well as from academia, touching all aspects of CAD (from physical design to functional verifications) from all over the world. This year's program includes 26 accepted papers, along with 4 keynotes and 4 plenary talks, and one panel. The accepted papers underwent a rigorous review by an expert Technical Program Committee of 32 experts, requiring at least 3 reviews per paper.

For accepted papers, we provide pre-recorded talks so that participants can familiarize themselves with the contribution. All workshop sessions will then be conducted live to allow and encourage questions and discussions among the participants.

Best paper candidates have been selected and will be highlighted in the program. The best paper will be announced during the final day of MLCAD 2020.