Novel fiducial grid for x-ray masks

Choi Pheng Soo; Shobhna Chandra; Kong Jong Ren; Antony J. Bourdillon; Bing Lu

doi:10.1117/12.351158

25 June 1999 Novel fiducial grid for x-ray masks

Choi Pheng Soo, Shobhna Chandra, Kong Jong Ren, Antony J. Bourdillon, Bing Lu

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351158
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Advances in today's semiconductor industry have been achieved mainly by decreasing the minimal feature size thereby increasing the complexity of the devices. Lithography tool shave to provide for high resolution and large depth of focus. X-ray lithography offers promising solutions and is currently an actively researched area.

Citation Download Citation

Choi Pheng Soo, Shobhna Chandra, Kong Jong Ren, Antony J. Bourdillon, and Bing Lu "Novel fiducial grid for x-ray masks", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351158

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