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Faster optimal single-row placement with fixed ordering

Published: 01 January 2000 Publication History
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References

[1]
M.R. Garey, D.S. Johnson, L. Stockmeyer: Some Simplified NP-Complete Graph Problems. Theoretical Computer Science 1 (1976), 237-267
[2]
A.B. Kahng, P. Tucker, A. Zelikovsky: Optimization of Linear Placements for Wirelength Minimization with Free Sites. Proc. of the Asia and South Pacific Design Automation Conference, 1999, 241-244
[3]
J. Vygen: Algorithms for Detailed Placement of Standard Cells. Proc. of the Conference Design, Automation and Test in Europe (DATE'98), IEEE 1998, 321- 324

Cited By

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  • (2023)A Fast Optimal Double-row Legalization AlgorithmACM Transactions on Design Automation of Electronic Systems10.1145/357984428:5(1-26)Online publication date: 21-Jan-2023
  • (2021)A Fast Optimal Double Row Legalization AlgorithmProceedings of the 2021 International Symposium on Physical Design10.1145/3439706.3447044(23-30)Online publication date: 22-Mar-2021
  • (2020)Self-aligned double-patterning aware legalizationProceedings of the 23rd Conference on Design, Automation and Test in Europe10.5555/3408352.3408613(1145-1150)Online publication date: 9-Mar-2020
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    cover image ACM Conferences
    DATE '00: Proceedings of the conference on Design, automation and test in Europe
    January 2000
    707 pages
    ISBN:1581132441
    DOI:10.1145/343647
    Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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    • EDAA: European Design Automation Association
    • ECSI
    • EDAC: Electronic Design Automation Consortium
    • SIGDA: ACM Special Interest Group on Design Automation
    • IEEE-CS: Computer Society
    • IFIP: International Federation for Information Processing
    • The Russian Academy of Sciences: The Russian Academy of Sciences

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    New York, NY, United States

    Publication History

    Published: 01 January 2000

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    DATE00
    Sponsor:
    • EDAA
    • EDAC
    • SIGDA
    • IEEE-CS
    • IFIP
    • The Russian Academy of Sciences
    DATE00: Design Automation and Test in Europe
    March 27 - 30, 2000
    Paris, France

    Acceptance Rates

    Overall Acceptance Rate 518 of 1,794 submissions, 29%

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    Cited By

    View all
    • (2023)A Fast Optimal Double-row Legalization AlgorithmACM Transactions on Design Automation of Electronic Systems10.1145/357984428:5(1-26)Online publication date: 21-Jan-2023
    • (2021)A Fast Optimal Double Row Legalization AlgorithmProceedings of the 2021 International Symposium on Physical Design10.1145/3439706.3447044(23-30)Online publication date: 22-Mar-2021
    • (2020)Self-aligned double-patterning aware legalizationProceedings of the 23rd Conference on Design, Automation and Test in Europe10.5555/3408352.3408613(1145-1150)Online publication date: 9-Mar-2020
    • (2017)Detailed Placement for Two-Dimensional Directed Self-Assembly TechnologyProceedings of the 54th Annual Design Automation Conference 201710.1145/3061639.3062229(1-6)Online publication date: 18-Jun-2017
    • (2017)Placement mitigation techniques for power grid electromigration2017 IEEE/ACM International Symposium on Low Power Electronics and Design (ISLPED)10.1109/ISLPED.2017.8009178(1-6)Online publication date: Jul-2017
    • (2017)Stitch aware detailed placement for multiple E-beam lithographyIntegration10.1016/j.vlsi.2017.02.00458(47-54)Online publication date: Jun-2017
    • (2016)Heuristics for Iterative Detailed Standard Cell PlacementProceedings of the SouthEast European Design Automation, Computer Engineering, Computer Networks and Social Media Conference10.1145/2984393.2984409(19-24)Online publication date: 25-Sep-2016
    • (2016)Stitch aware detailed placement for multiple e-beam lithography2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC)10.1109/ASPDAC.2016.7428009(186-191)Online publication date: Jan-2016
    • (2016)Standard Cell Compliance and Placement Co-OptimizationDesign for Manufacturability with Advanced Lithography10.1007/978-3-319-20385-0_4(83-109)Online publication date: 2016
    • (2015)Triple Patterning Aware Detailed Placement Toward Zero Cross-Row Middle-of-Line ConflictProceedings of the IEEE/ACM International Conference on Computer-Aided Design10.5555/2840819.2840875(396-403)Online publication date: 2-Nov-2015
    • Show More Cited By

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