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An integrated mask artwork analysis system

Published: 23 June 1980 Publication History
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  • Abstract

    A new LSI artwork analysis and processing system, called EMAP, is described with algorithms, a database schema and applications. EMAP provides the designer with the artwork verification and processing tools which include mask artwork processing, geometrical design rule checking, connectivity analysis and electrical circuit parameter calculation. The circuit connectivity data derived from the mask artwork data is used for input to a logic simulator, a timing simulator, a circuit simulator and a circuit schematic generator.

    References

    [1]
    K. Kani, A. Yamada and M. Teramoto, "CAD in The Japanese Electronic Industry" Symp. on CAD of Digital Electronic Circuits and Systems, Brussels, pp. 115-131 (Nov. 1978).
    [2]
    B. W. Lindsay and B. T. Preas, "Design Rule Checking and Analysis of IC Mask Design", Proc. 13th Design Automation Conference, pp. 301-308 (June 1976).
    [3]
    H. S. Baird, "Fast Algorithms for LSI Artwork Analysis", Proc. 14th Design Automation Conference, pp. 303-311 (June 1977).
    [4]
    K. Yoshida, T. Mitsuhashi, Y. Nakada, T. Chiba, K. Ogita and S. Nakatsuka, "A Layout Checking System for Large Scale Integrated Circuits", Proc. 14th Design Automation Conference, pp. 322-330 (June 1977).
    [5]
    P. Wilcox, H. Rombeek and D. M. Caughey, "Design Rule Verification Basen on One Dimensional Scans", Proc. 15th Design Automation Conference, pp. 285-289 (June 1978).
    [6]
    H. S. Baird and Y. E. Cho, "An Artwork Design Verification System", Proc. 12th Design Automation Conference, pp. 414-420 (June 1975).
    [7]
    B. T. Preas, B. W. Lindsay and C. W. Gwyn, "Automatic Circuit Analysis Based on Mask Information", Proc. 13th Design Automation Conference, pp. 309-317 (June 1976).
    [8]
    C. R. McCaw, "Unified Shapes Checker - A Cheking Tool for LSI", Proc. 16th Design Automation Conference, pp. 81-87 (June 1979).
    [9]
    C.S. Chang, "LSI Layout Checking Using Bipolar Device Recognition Technique", Proc. 16th Design Automation Conference, pp. 95-101 (June 1979).
    [10]
    P. Losleben and K. Tompson, "Topological Analysis for VLSI Circuits", Proc. 16th Design Automation Conference, pp. 461-473 (June 1979).
    [11]
    K. Hirabayashi and M. Kawamura, "MACLOS - A Mask Checking Logic Simulator" (to appear).
    [12]
    M. Kawamura and K. Hirabayashi, "MACTIS - A Mask Checking Timing Simulator" (to appear).
    [13]
    A. V. Aho, J. E. Hopcroft and J. D. Ullman "The Design and Analysis of Computer Algorithms", Addison-Wesley, Reading, 1974.
    [14]
    "CODASYL Data Description Language Journal of Development June, 1973".

    Cited By

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    • (2016)Design DatabasesElectronic Design Automation for IC Implementation, Circuit Design, and Process Technology10.1201/b19714-17(349-371)Online publication date: 14-Apr-2016
    • (2006)A Resistance Calculation Algorithm and Its Application to Circuit ExtractionIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.1987.12702786:3(337-345)Online publication date: 1-Nov-2006
    • (2003)GOALIE: A Space-Efficient System for VLSI Artwork AnalysisThe Best of ICCAD10.1007/978-1-4615-0292-0_38(489-497)Online publication date: 2003
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    1. An integrated mask artwork analysis system

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        cover image ACM Conferences
        DAC '80: Proceedings of the 17th Design Automation Conference
        June 1980
        642 pages
        Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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        Publication History

        Published: 23 June 1980

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        View all
        • (2016)Design DatabasesElectronic Design Automation for IC Implementation, Circuit Design, and Process Technology10.1201/b19714-17(349-371)Online publication date: 14-Apr-2016
        • (2006)A Resistance Calculation Algorithm and Its Application to Circuit ExtractionIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.1987.12702786:3(337-345)Online publication date: 1-Nov-2006
        • (2003)GOALIE: A Space-Efficient System for VLSI Artwork AnalysisThe Best of ICCAD10.1007/978-1-4615-0292-0_38(489-497)Online publication date: 2003
        • (1988)A circuit comparison system with rule-based functional isomorphism checkingProceedings of the 25th ACM/IEEE Design Automation Conference10.5555/285730.285813(512-516)Online publication date: 1-Jun-1988
        • (1988)A new approach for circuit extraction based on overlay graph1988., IEEE International Symposium on Circuits and Systems10.1109/ISCAS.1988.15202(1449-1452)Online publication date: 1988
        • (1986)Advanced super integrationProceedings of 1986 ACM Fall joint computer conference10.5555/324493.325019(1008-1013)Online publication date: 2-Nov-1986
        • (1986)AN LSI MASK ARTWORK VERIFICATION AND PROCESSING SYSTEM JC—81Control Science and Technology for Development10.1016/B978-0-08-033473-8.50049-8(253-256)Online publication date: 1986
        • (1985)Annotated BibliographyInformation Management for Engineering Design10.1007/978-3-642-82438-8_8(89-93)Online publication date: 1985
        • (1984)EXCLProceedings of the 21st Design Automation Conference10.5555/800033.800863(616-623)Online publication date: 25-Jun-1984
        • (1984)Functional verification of memory circuits from mask artwork dataProceedings of the 21st Design Automation Conference10.5555/800033.800801(228-234)Online publication date: 25-Jun-1984
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