Abstract

The demand for ion beam sputtering (IBS) coated substrates is growing. In order to introduce IBS technology into new fields of application, the uniform deposition area (UDA) must be further increased. In the present investigation, a simple approach toward enlarging a UDA and the corresponding scaling laws are presented. By taking symmetry properties into account, the collection efficiency of the sputtered particles could be doubled. A process is demonstrated which allows the simultaneous and uniform coating of two areas each with a diameter of 600 mm.

© 2020 Optical Society of America

Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering

Cheng Li, Shigeng Song, Des Gibson, David Child, Hin on Chu, and Ewan Waddell
Appl. Opt. 56(4) C65-C70 (2017)

Coatings for optical applications produced by ion beam sputter deposition

Jurgen Becker and Volker Scheuer
Appl. Opt. 29(28) 4303-4309 (1990)

Ion beam sputtering coatings on large substrates: toward an improvement of the mechanical and optical performances

Bernard Cimma, Danièle Forest, Patrick Ganau, Bernard Lagrange, Jean-Marie Mackowski, Christophe Michel, Jean-Luc Montorio, Nazario Morgado, Renée Pignard, Laurent Pinard, and Alban Remillieux
Appl. Opt. 45(7) 1436-1439 (2006)

Ultra-low stress SiO₂ coatings by ion beam sputtering deposition

Aaron Davenport, Emmett Randel, and Carmen S. Menoni
Appl. Opt. 59(7) 1871-1875 (2020)

Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method

Mark Gross, Svetlana Dligatch, and Anatoli Chtanov
Appl. Opt. 50(9) C316-C320 (2011)