Ion Plating

During the last many decades the methods of forming thin films materials have increased significantly. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. This project examines some remarkable similarities and differences between PVD and CVD systems as well as evaluates the different techniques of depositing thin film. The majority of researchers have attempted to explain and justify the most precise system for depositing thin film since it is important in several applications such as surgical/medical and automotive. It is concluded that the most efficient method of depositing is PVD process. In addition, it has been found that there are more differences than similarities between PVD and CVD processes.

Resumo Na medicina moderna, os biomateriais têm sido largamente utilizados como implantes. Dentre os biomateriais, o titânio de classe medicinal destaca-se pelo seu elevado grau de biocompatibilidade. Entretanto, ´ orteses e próteses infectadas com microrganismos pós-implantadas requerem cirurgias e intervenções médicas que são dispendiosas e o tratamento pode levar meses. Para combater infecções associadas a implantes, a melhor estratégiá e prevenir que elas ocorram. Uma das estratégiasé a implantação dé ıons de prata no titânio. Neste trabalho, ´ ıons de prata foram implantados a baixas energias (4 keV) no titânio de uso medicinal com o objetivo de tornar a superfície do titânio bactericida e, assim, inibir a formação de biofilme. A implantação foi realizada em um equipamento do tipo Ion Plating. As amostras foram analisadas por espectrometria de Retroespalhamento de Rutherford (RBS), espectroscopia de emissãó otica por descarga luminescente (GD-OES) e difração de raios X (XRD). Os resultados obtidos mostram que a prata está implantada em profundidade de até 10 nm, corroborando com os dados da simulação realizada previamente. Além disso, a estratégia utilizada neste trabalho pode ser aplicada em escala industrial, devido ao tipo de equipamento utilizado para o tratamento da superfície. Abstract In modern medicine, biomaterials have been widely used as implants. Among biomaterials, titanium medical class is distinguished by its high degree of biocompatibility. However, orthoses and prostheses infected with post-implanted microorganisms require surgeries and medical interventions that are costly and treatment can take months. To combat infections associated with implants, the best strategy is to prevent them from occurring. One strategy is the silver ion implantation in titanium. In this work, silver ions were implanted at low energies (4 keV) in medical titanium with the goal to render bactericidal titanium surface and therefore, inhibit biofilm formation. The implantation was done using the Ion Plating equipment. After ion implantation, the samples were analyzed by Rutherford Backscattering Spectrometry, Glow-Discharge Optical Emission Spectroscopy and X-Ray Diffraction. The results show that the silver was implanted at depths up to 10 nm, corroborating simulation data. In addition, the strategy used in this work can be applied on an industrial scale due to the type of equipment used for the surface treatment.

X= 0 (ie, asymptotically smooth). This fixed point (contrary to the implications of the previous Comment) need not apply to the Eden process. Most Eden processes, because of the absence of any surface tension, are likely to be in the strong-coupling limit (the effective nonlinearity scales as i's), and should be described by the nontrivial fixed point. Indeed the observation that the trends (logarithmic in 2+ 1 and con-stant in 3+ 1 dimensions) cross over to a new behavior for large L confirms our prediction that the surface is approaching this ...

A rapid decrease in the critical current density (Jc) of YBa2Cu3O7-x (YBCO) films with increasing film thickness has been observed for multiple YBCO growth processes. While such behavior is predicted from two-dimensional collective pinning models under certain assumptions, empirical observations of the thickness dependence of Jc are believed to be largely processing dependent at present. To investigate this behavior in ex situ YBCO films, 2.0- and 2.9-μm-thick YBCO films on ion beam assisted deposition-yttria stabilized zirconia substrates were thinned and repeatedly measured for ρ(T) and Jc(H). The 2.9 μm film exhibited a constant Jc[77 K, self-field (SF)] through thickness of ˜1 MA/cm2 while the 2.0 μm film exhibited an increase in Jc(77 K, SF) as it was thinned. Neither film offered evidence of significant dead layers, suggesting that further increases in critical current can be obtained by growing thicker YBCO layers.