Location via proxy:   [ UP ]  
[Report a bug]   [Manage cookies]                

deposition rates
Recently Published Documents


TOTAL DOCUMENTS

810
(FIVE YEARS 66)

H-INDEX

48
(FIVE YEARS 3)

CATENA ◽  
2022 ◽  
Vol 211 ◽  
pp. 105974
Author(s):  
Krzysztof G. Rymer ◽  
Grzegorz Rachlewicz ◽  
Agata Buchwal ◽  
Arnaud J.A.M. Temme ◽  
Tony Reimann ◽  
...  
Keyword(s):  

Author(s):  
Chongliang Zhong ◽  
Venkatesh Pandian Narayana Samy ◽  
Norbert Pirch ◽  
Andres Gasser ◽  
Gandham Phanikumar ◽  
...  

Nature ◽  
2021 ◽  
Author(s):  
Paul J. Blanchfield ◽  
John W. M. Rudd ◽  
Lee E. Hrenchuk ◽  
Marc Amyot ◽  
Christopher L. Babiarz ◽  
...  

AbstractAnthropogenic releases of mercury (Hg)1–3 are a human health issue4 because the potent toxicant methylmercury (MeHg), formed primarily by microbial methylation of inorganic Hg in aquatic ecosystems, bioaccumulates to high concentrations in fish consumed by humans5,6. Predicting the efficacy of Hg pollution controls on fish MeHg concentrations is complex because many factors influence the production and bioaccumulation of MeHg7–9. Here we conducted a 15-year whole-ecosystem, single-factor experiment to determine the magnitude and timing of reductions in fish MeHg concentrations following reductions in Hg additions to a boreal lake and its watershed. During the seven-year addition phase, we applied enriched Hg isotopes to increase local Hg wet deposition rates fivefold. The Hg isotopes became increasingly incorporated into the food web as MeHg, predominantly from additions to the lake because most of those in the watershed remained there. Thereafter, isotopic additions were stopped, resulting in an approximately 100% reduction in Hg loading to the lake. The concentration of labelled MeHg quickly decreased by up to 91% in lower trophic level organisms, initiating rapid decreases of 38–76% of MeHg concentration in large-bodied fish populations in eight years. Although Hg loading from watersheds may not decline in step with lowering deposition rates, this experiment clearly demonstrates that any reduction in Hg loadings to lakes, whether from direct deposition or runoff, will have immediate benefits to fish consumers.


2021 ◽  
Author(s):  
◽  
Dayna-Maree Kivell

<p>The aim of this study was to develop a deposition process using RF magnetron sputtering for the production of zinc oxide (ZnO) thin films on glass substrates. These ZnO films were to be used as the active piezoelectric element in very high frequency ultrasound transducers (> 300 MHz). In order to achieve piezoelectric activity the films had to be oriented with the c-axis of the ZnO grains perpendicular to the substrate surface. At the same time, a moderately high, at least 1 m=hr (17 nm=min) deposition rate was required for the production of practical devices. Prior to a full investigation into the sputtering parameters, an initial evaluation of the HHV Auto500 RF magnetron sputter coater system was performed. Using the original chamber configuration it was not possible to deposit ZnO at the required deposition rates. A modification of the growth chamber to allow a reduced target-substrate distance was successful in producing ZnO films at the required deposition rates. A systematic study into the deposition parameters and their effect on the ZnO film quality and deposition rates was then performed and it was found that strong c-axis oriented films could be deposited only when depositing at rates below 15 nm=min at a low substrate temperature (< 50 C). Depositions above this rate resulted in the growth of polycrystalline films. A two-step deposition process was designed to preserve c-axis orientation at high deposition rates up to 28 nm=min. The ZnO films were found to be highly strained due to inherent stress from the sputtering process. The deposition pressure was identified as the most critical deposition parameter for stress control. It was found that deposition above a critical pressure of 1:2 x10-² mbar was essential to prevent mechanical failure of the films. Post growth annealing was investigated and determined to be a viable technique to relax stress and improve the crystalline quality of the films. Finally a four-step deposition process was proposed to facilitate the growth of c-axis oriented ZnO films at relatively high deposition rates whilst minimising film stress.</p>


2021 ◽  
Author(s):  
◽  
Dayna-Maree Kivell

<p>The aim of this study was to develop a deposition process using RF magnetron sputtering for the production of zinc oxide (ZnO) thin films on glass substrates. These ZnO films were to be used as the active piezoelectric element in very high frequency ultrasound transducers (> 300 MHz). In order to achieve piezoelectric activity the films had to be oriented with the c-axis of the ZnO grains perpendicular to the substrate surface. At the same time, a moderately high, at least 1 m=hr (17 nm=min) deposition rate was required for the production of practical devices. Prior to a full investigation into the sputtering parameters, an initial evaluation of the HHV Auto500 RF magnetron sputter coater system was performed. Using the original chamber configuration it was not possible to deposit ZnO at the required deposition rates. A modification of the growth chamber to allow a reduced target-substrate distance was successful in producing ZnO films at the required deposition rates. A systematic study into the deposition parameters and their effect on the ZnO film quality and deposition rates was then performed and it was found that strong c-axis oriented films could be deposited only when depositing at rates below 15 nm=min at a low substrate temperature (< 50 C). Depositions above this rate resulted in the growth of polycrystalline films. A two-step deposition process was designed to preserve c-axis orientation at high deposition rates up to 28 nm=min. The ZnO films were found to be highly strained due to inherent stress from the sputtering process. The deposition pressure was identified as the most critical deposition parameter for stress control. It was found that deposition above a critical pressure of 1:2 x10-² mbar was essential to prevent mechanical failure of the films. Post growth annealing was investigated and determined to be a viable technique to relax stress and improve the crystalline quality of the films. Finally a four-step deposition process was proposed to facilitate the growth of c-axis oriented ZnO films at relatively high deposition rates whilst minimising film stress.</p>


Fuel ◽  
2021 ◽  
Vol 303 ◽  
pp. 121217
Author(s):  
Gautham Krishnamoorthy ◽  
Monika E. Kuznia ◽  
KayLee M. Smith ◽  
Wayne S. Seames ◽  
Yueming Wang ◽  
...  

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1218
Author(s):  
Žiga Gosar ◽  
Denis Đonlagić ◽  
Simon Pevec ◽  
Bojan Gergič ◽  
Miran Mozetič ◽  
...  

The deposition rates of protective coatings resembling polydimethylsiloxane (PDMS) were measured with numerous sensors placed at different positions on the walls of a plasma-enhanced chemical vapor deposition (PECVD) reactor with a volume of approximately 5 m3. The plasma was maintained by an asymmetric capacitively coupled radiofrequency (RF) discharge using a generator with a frequency 40 kHz and an adjustable power of up to 8 kW. Hexamethyldisiloxane (HMDSO) was leaked into the reactor at 130 sccm with continuous pumping using roots pumps with a nominal pumping speed of 8800 m3 h−1 backed by rotary pumps with a nominal pumping speed of 1260 m3 h−1. Deposition rates were measured versus the discharge power in an empty reactor and a reactor loaded with samples. The highest deposition rate of approximately 15 nm min–1 was observed in an empty reactor close to the powered electrodes and the lowest of approximately 1 nm min–1 was observed close to the precursor inlet. The deposition rate was about an order of magnitude lower if the reactor was fully loaded with the samples, and the ratio between deposition rates in an empty reactor and loaded reactor was the largest far from the powered electrodes. The results were explained by the loss of plasma radicals on the surfaces of the materials facing the plasma and by the peculiarities of the gas-phase reactions typical for asymmetric RF discharges.


Metals ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1530
Author(s):  
Harley Stinson ◽  
Richard Ward ◽  
Justin Quinn ◽  
Cormac McGarrigle

The process of Wire Arc Additive Manufacturing (WAAM) utilizes arc welding technology to fabricate metallic components by depositing material in a selective layered fashion. Several welding processes exist that can achieve this layered deposition strategy. Gas Metal Arc Welding (GMAW) derived processes are commonly favored for their high deposition rates (1–4 kg/h) and minimal torch reorientation required during deposition. A range of GMAW processes are available; all of which have different material transfer modes and thermal energy input ranges and the resultant metallic structures formed from these processes can vary in their mechanical properties and morphology. This work will investigate single-layer deposition and vary the process parameters and process mode to observe responses in mechanical properties, bead geometry and deposition rate. The process modes selected for this study were GMAW derived process of Metal Inert Gas (MIG) and Cold Metal Transfer (CMT). Characterization of parameter sets revealed relationships between torch travel speeds, wire feed speeds and the specimen properties and proportions. Differences were observed in the cross-sectional bead geometry and deposition rates when comparing MIG and CMT samples though the influence of process mode on mechanical properties was less significant compared to process parameter selection.


2021 ◽  
Author(s):  
Mizuo Kajino ◽  
Akira Watanabe ◽  
Masahide Ishizuka ◽  
Kazuyuki Kita ◽  
Yuji Zaizen ◽  
...  

Abstract. Resuspension of 137Cs from the contaminated ground surface to the atmosphere is essential for understanding the environmental behaviors of 137Cs and estimating external and inhalation exposure of residents. Kajino et al. (2016) assessed the 137Cs resuspension flux from bare soil and forest ecosystems in East Japan in 2013 using a numerical simulation constrained by surface air concentration measurements. However, the simulation was found to underestimate the observed deposition amounts by two orders of magnitude. The reason for this underestimation is that the simulation assumed that resuspended 137Cs is carried by submicron aerosols, which have low deposition rates. Based on the observational indications that soil dust and bioaerosols are the major carriers of resuspended 137Cs, a new simulation is performed with higher deposition rates constrained by both surface concentrations and deposition amounts. In the new estimation, the areal total annual resuspension of 137Cs in 2013 is 25.7 TBq, which is equivalent to 0.96 % of the initial deposition (2.68 PBq). Due to the rapid deposition rates, the annual redeposition amount is also large at 10.6 TBq, approximately 40 % of the resuspended 137Cs. The resuspension rate through the atmosphere (0.96 % y−1) seems slow, but it (2.6 × 10−5 d−1) may not be negligibly small compared to the actual decreasing trend of the ambient gamma dose rate obtained in Fukushima Prefecture after the radioactive decay of 137Cs plus 134Cs in 2013 is subtracted (1.0–7.9 × 10−4 d−1): Resuspension can account for 1–10 % of the decreasing rate due to decontamination and natural decay through land surface processes. The current simulation underestimated the 137Cs deposition in Fukushima city in winter by more than an order of magnitude, indicating the presence of additional resuspension sources. The site of Fukushima city is surrounded by major roads. Heavy traffic on wet and muddy roads after snow removal operations could generate superlarge (approximately 100 µm in diameter) road dust or road salt particles, which is not included in the model but might contribute to the observed 137Cs at the site.


Export Citation Format

Share Document