Module 4
Module 4
COLLEGE OF ENGINEERING
DEPARTMENT OF INDUSTRIAL ENGINEERING
MODULE 4
DESIGN OF EXPERIMENTS WITH SEVERAL FACTORS
FACTORIAL EXPERIMENTS
Page 1 of 15
To read the figure below, we designate the negative sign as low
and the positive sign as high. Thus, a low level of Factor A and a
low level of Factor B will give us a result of 10, etc.
Average response at
high level Average response at
low level
This means that changing Factor A from the low level to the high
level causes an average response increase of 20 units.
N.B. Can you prove given the data above that the main effect of
Factor B is 10?
Page 2 of 15
this occurs, this means that there is an interaction between the
factors. Consider the data given in the table below:
Factor B
Factor A Low High
Low 10 20
High 30 0
A = 30 10 = 20
and at the high level of B, the A effect is
A = 0 20 = 20
Since the effect of Factor A depends on the level chosen for Factor
B, there is interaction between factors A and B. Thus, knowledge
of the AB interaction is more useful than knowledge of the main
effect. When an interaction is present, the main effects of the
factors involved in the interaction may not have much meaning.
Factor B
Factor A Low High
Low 10 20
High 30 0
20 + 30 10 + 0
AB = = 20
2 2
Page 3 of 15
The concept of interaction can be illustrated graphically in several
ways. One such way is a two-factor interaction plot, similar to the
figures below. They are often useful in presenting the results of
experiments.
50
40
Observation
30 B High
20 B Low
10
0
Low High
Factor A
35
30
Observation
25
20 B High
15 B Low
10
5
0
Low High
Factor A
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TWO-FACTOR FACTORIAL EXPERIMENTS
Factor B
1 2 b
Page 5 of 15
Statistical Analysis of the Fixed-Effects Model
1. H 0 : 1 = 2 = =a = 0
H 1 : at least one i 0
2. H 0 : 1 = 2 = = b = 0
H 1 : at least one j 0
3. H 0 : ( )1 = ( )2 = = ( )ab = 0
H 1 : at least one ( )ij 0
Page 6 of 15
The ANOVA table is constructed as follows:
Application Method
Primer Dipping Spraying
1 4.0 4.5 4.3 5.4 4.9 5.6
2 5.6 4.9 5.4 5.8 6.1 6.3
3 3.8 3.7 4.0 5.5 5.0 5.0
Page 7 of 15
adhesion force was measured. The data are shown above. Do the
individual factors, i.e. primer type and application method, and/or
their interaction have an effect on the adhesion strength?
1. H 0 : 1 = 2 = =a = 0
H 1 : at least one i 0
2. H 0 : 1 = 2 = = b = 0
H 1 : at least one j 0
3. H 0 : ( )1 = ( )2 = = ( )ab = 0
H 1 : at least one ( )ij 0
Degrees
Sum of of Mean
Source of Variation Squares Freedom Square F0
Primer Types 4.58 2 2.29 28.63
Application Method 4.91 1 4.91 61.38
Interaction 0.24 2 0.12 1.50
Error 0.99 12 0.08
Total 10.72 17
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STEP 5: Declare your critical regions
Page 9 of 15
A SSA a-1 MSA MSA/MSE
B SSB b-1 MSB MSB/MSE
C SSC c-1 MSC MSC/MSE
AB SSAB (a-1)(b-1) MSAB MSAB/MSE
AC SSAC (a-1)(c-1) MSAC MSAC/MSE
BC SSBC (b-1)(c-1) MSBC MSBC/MSE
ABC SSABC (a-1)(b-1)(c-1) MSABC MSABC/MSE
Error SSE abc(n-1) MSE
Total SST abcn-1
Depth of Cut
0.025 inch 0.040 inch
Tool Angle Tool Angle
Feed Rate 15o 25o 15o 25o
9 11 9 10
20 in. per min.
7 10 11 8
10 10 12 16
30 in. per min.
12 13 15 14
Page 10 of 15
Degrees
Source of Sum of Mean
of F0
Variation Squares Square
Freedom
2k FACTORIAL DESIGNS
Page 11 of 15
Perhaps one of the most (if not the most) important of these special
cases is that of k factors, with each factor only having two levels.
22 Design
The simplest type of the 2k design is the 22, i.e. two factors A and
B, each at two levels (high and low levels):
High effect of
factor A; low effect
of factor B
Low effects of both
factors A and B
Page 12 of 15
To compute for the different sum of squares for a 22 experiment,
we have the following equations:
SS A =
[ a + ab b (1)]
2
4n
SS B =
[b + ab a (1)]
2
4n
SS AB =
[ ab + (1) a b]
2
4n
SS =
( contrast )
2
n2 k
In addition, the average effect of each interaction as it changes
from a low level to a high level is computed as:
contrast
Effect =
n2 k 1
Page 13 of 15
EXAMPLE # 3: An article in the AT&T Technical Journal
describes the application of two-level factorial designs to
integrated circuit manufacturing. A basic processing step in this
industry is to grow an epitaxial layer on polished silicon wafers.
The wafers are mounted on a susceptor and positioned inside a bell
jar. Chemical vapors are introduced through nozzles near the top of
the jar. The susceptor is rotated, and heat is applied. These
conditions are maintained until the epitaxial layer is thick enough.
Data collected are shown in the table below:
Page 14 of 15
Deposition time and therefore conclude that Deposition time alone
has a significant effect on the epitaxial layer thickness.
A (deposition
0.836
time)
B (arsenic
0.067
flow)
AB 0.032
The values of the estimates of the effects are consistent with the
conclusion we obtained from our ANOVA. As can be seen from
above, the effect of deposition time is much more than the effect o
arsenic flow and their interaction.
Page 15 of 15