Phase 2 Report
Phase 2 Report
Phase 2 Report
CHAPTER 1
INTRODUCTION
Fig 1.1 unrolled graphite sheet Fig 1.2 Cross section view of CNTFET
3. A receiver that converts the signal energy of the wire back to bits.
4. Timing recovery circuit that compensates for the time delay of the wire.
Under scaling, a circuit with the same functionality will be smaller in a new
technology. Interconnect of this circuit will also become shorter and these
5
Fig 1.7 ITRS 2001 Predictions for Logic and Wire Delays
interconnect delays rise with technology scaling for one of two different
reasons. They are
(i) The overall chip size increases so that interconnects need to span
longer distances.
RC
τ= (l total )2
2 (1.1)
Where, R and C are resistance and capacitance per unit length. L total
length of the interconnect.
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CHAPTER 2
LITERATURE SURVEY
CHAPTER 3
TRANSMITTER ARCHITECTURES
Advantages
Disadvantages
Advantages
The signal conveyed to the channel by the driver is the output voltage of
the inverter. It is determined from
dv o ( t ) dv o ( t )−V DD
CL + −C L V OL ∂ ( t )=0(Rising edge ) (3.1)
dt Rp
dv o ( t ) dv ( t )
CL −C L V OH ∂ ( t ) + o =0 ( Falling edge ) (3.2)
dt Rn
where Rn and Rp are the channel resistance of the NMOS and PMOS
transistors in the triode, respectively, CL is the load capacitance of the driver,
VOL and VOH are the voltage of Logic-0 and Logic-1 states, respectively,
C L V OL ∂ ( t )∧¿ C L V OH ∂(t)quantify the effect of the initial voltage of the load
In below table 3.1 Shows that the comparison of voltage mode and
current mode signaling techniques.
Table 3.1 Difference between the Voltage mode and Current mode Signaling
Serializer (Multiplexer)
Pre driver
Output driver
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V OH =V DD , (3.2)
Rn
V OL = V (3.3)
R n+ R p DD ,
c) Current-Steering Multiplexer
d) Yang’s Multiplexer
1 1
∨¿ Rn in the pull-down operation and i in the pullup operation. The
gm gm
∆ v=J ( g1 − g1 ∨¿ R )
m m
n (3.4)
Both the voltage swing and the impedance of the multiplexing node of
the pseudo NMOS multiplexer are larger than those of the current mode
21
multiplexer. It is seen that the rising time is much larger as compared with
the falling time, mainly due to the small width of the pullup PMOS transistor.
Also observed is that both decrease monotonically with the increase in the
size of the pull up PMOS transistor.
a) Inverter Drivers
A load resistor at the far end of the channel provides both impedance
matching and current to voltage conversion. As compared with open drain
drivers whose output current always flows in one direction (unipolar
signalling), LVDS drivers convey two currents of equal amplitude but
opposite polarity to the channel (bipolar signalling), minimizing the
electromagnetic interference exerted from the channel to neighbouring
devices. A main drawback of LVDS drivers is the need for four transistors
stacked between the supply and ground rails makes them less attractive for
applications where only low supply voltages are available. The minimum
supply voltage of the driver can be estimated from
23
Advantages
1. It provides high input impedance
2. It consumes less power
Disadvantages
1. The overhead of designing a voltage regulator to control the output
swing”.
24
Advantages
1. It provides low input impedance
2. Less delay
3. Low swing and achieves wide bandwidth
4. Low power consumption at high frequency
5. Low cross talk and switching noise
6. High speed
3.3 MOSFET BASED TRANSMITTER ARCHITECTURE
The Existing transmitter is implemented by 180nm CMOS
Technology. As complementary metal-oxide semiconductor (CMOS)
continues to scale down deeper into the Nano-scale, various device non-
25
Figure 3.16 The gate of the transistors Fig 3.17 The number of transistors
through the forecast of Moore’s Law. chip for the past 40 years
The trans conductance (gm), which is referred to as the ratio between the
current output to the voltage input, is an important property for the FETs.
gm 1
≈ (3.5)
2 π C g L g2
From the equation above, as the gate length is reduced, the MOSFET will
get faster and increases the gain.
Following are the effects that would affect the internal performance of
MOSFET when the process of scaling occurs are:
28
a. Tunneling effect
b. Short channel effect
c. Threshold voltage
d. Oxide thickness
e. Ballistic Transport
Limitations that will occur when the process of scaling occurs are
theoretical limitations, economical limitations and technology limitations.
i) Limitations of MOSFET
As the possible effects and limitations of MOSFET will be discussed
in this section.
a. Tunneling effect
In an ideal case, transistors are being separated so as to ensure one
transistor’s operation will not affect the other transistor’s performances. A
material such as oxide can be used to acts as a barrier to prevent undesired
situation to occur. In small electronics devices that measures as small as in
nanometers, this barrier’s thickness is also measured in nanometers. With
such small thickness, the chances of carrier migration might occur.
c. Threshold voltage
When current begins to flow in the channel, voltage at the gate is
known as threshold voltage. In the graph plotted below, it shows how the
reduction of channel length affects the threshold voltage.
d. Oxide thickness
When the MOSFET has been scaled downsized, both the gate-oxide
thickness and voltage level will also be reduced. In order to ensure the gate
terminal of the MOSFET will have more control than the drain, it is
recommend having the gate oxide thickness proportional with the channel
length .
a a
á 1=( √ 3 , 1) and a´2=( √3 ,−1) (3.6)
2 2
where a=√ 3 acc =2.46 Å is the lattice constant and a cc=1.42 Å which refers to
the bond distance for graphene.
(3.7)
(3.8)
The threshold voltage of the CNFET is equal to half of the band gap and
can be expressed as:
(3.9)
When m=0 , the nanotube are known as zigzag. When n=m , the
nanotube are known as armchair. Else, they are called chiral. Depending on
In Figure 3.31, the graph on the left indicates the one-dimensional band
structure of the type of carbon nanotube. Understanding of band structure is
important as it allows the investigation of what is the range of energy that an
electron will travel in the carbon nanotube characteristic, especially in the
terms of electronics and physics. Figure 3.32 shows a simple illustration of
band gaps.
In structural look, the CNTFET looks like a MOSFET. The only change in
that he silicon channel is being replaced by carbon nanotubes. Improvements
such as orientations and arrangements of the carbon nanotube have been
constantly being research on so as to have a better end result. There are 2
main type of structure, they are known as back-gate CNTFET and top-gate
CNTFET. These two gated devices are commonly known as geometry
dependent CNTFET.
i) Back-Gate CNTFET
The first back-gated CNTFET was designed with thick gate insulators,
which is silicon oxide, measured in an estimation of 100 to 150 nm. Two
noble metal (normally gold) electrodes were being bridge with a single
SWCNT prefabricated by lithography onto an oxidized silicon wafer. Noble
metals are a type of metal which could resists acid attack and does not corrode
easily. In comparison with a silicon MOSFET, the SWCNT acts as a channel
while the two metal electrodes will play the role of source and drain channel
respectively. The silicon wafer, which is heavily doped, will behave as a back
gate.
38
With this structural design, there are some limitation such as high parasitic
contact resistance (measuring ≥1M ohm), low trans conductance (gm ≈ 1nS)
and low drive currents (measuring a few Nano amperes) [3] [8].
The possible root cause of such parasitic limitations is due to bad contact
between the carbon nanotube and the two gold electrodes. In order to have a
much better performance, the dielectric constant can be increased or the gate
capacitance can be increased while reducing the thickness of insulator.
This design’s performance turns out to be much better than the back-gate
CNTFET. Due to the device geometry, the electric field is increased and
contact resistance has been greatly reduced due to a different choice of
material. The threshold voltage has been lowered as compared to back-gate
CNTFET and higher drive current.
39
2) All chemical bonds of the C atoms are satisfied and there is no need for
chemical passivation of dangling bonds as in silicon. This implies that CNT
electronics would not be bound to use SiO 2 as an insulator. High dielectric
constant and crystalline insulators can be used, allowing, among other things,
the fabrication of
three-dimensional (3-D) structures.
3) The strong covalent bonding gives the CNTs high mechanical and thermal
stability and resistance to electro-migration. Current densities as high as 10 9
A/cm2 can be sustained
4) Their key dimension, their diameter, is controlled by chemistry, not
conventional fabrication.
5) In principle, both active devices (transistors) and interconnects can be
made out of semiconducting and metallic nanotubes, respectively.
In the above table 3.3 shows that the threshold voltage of the CNTFET
and MOSFET with respect to their channel lengths.
Table 3.4 Device parameter and process assumptions for simulations
(CNTFET model)
42
In the above table 3.4 it shows that the Device Parameters and the
process assumptions of CNTFET used for Simulation.
3.4.4 MVL (Multi Valued Logic) of CNTFET
In a CNTFET, the threshold voltage of the transistor is determined by
the diameter of the CNT. Therefore, a multi-threshold design can be
accomplished by employing CNTs with different diameters (and, therefore,
chirality) in the CNTFETs. A resistive-load CNTFET-based ternary logic
design has been proposed. However, in this configuration, large OFF-chip
resistors (of at least 100MΩ values) are needed due to the current requirement
of the CNTFETs. The design technique proposed in this paper relies on and
eliminates the large resistors by employing Active load with P-type CNTFETs
in the ternary logic(three valued logic) gates. Ternary logic has been attracted
considerable interest due to its potential advantages over binary logic for
designing digital systems. For example, it is possible for ternary logic to
achieve simplicity and energy efficiency in digital design since the logic
reduces the complexity of interconnects and chip area. The multivalued logic
design based on multi threshold CNTFETs is assessed and compared with
existing designs based on CNTFETs.
43
multiplexer requires only one driver for all the inputs. Input data and
depending on the selected line the output to be high. The signal driven by the
predriver. Predriver nothing but static inverter used to reduce the output delay
and convert full swing signal into limited signal. Finally Output Driver to
reduce the swing and reducing power consumption. In Voltage mode driver
the capacitor is charging and discharging the signal value is 1F. Similarly the
complement signal is generated using the complemented data inputs to output.
3.4.5.2 Current Mode Transmitter
The large size of voltage mode drivers and the large amount of delay
and energy consumed by the required predrivers are a significant
disadvantage of voltage mode signalling.
The current mode drivers are significantly faster and more power
efficient than low impedance voltage mode driver. So to reduce output delay,
current steering driver should be used with limited swing pre-driver. It
45
Fig 3.42 Multiple Valued Logic Using Resistor Loaded Ternary SIPF
48
In the above Fig 3.42 the NAND gate is replaced by Resistor loaded
NAND using Multiple Valued Logic Circuits (Multi Threshold Logic) and the
In the above Fig 3.43 the NAND gate is replaced by PSEUDO NCNFET
NAND using Multiple Valued Logic Circuits (Multi Threshold Logic) and the
CHAPTER 4
SIMULATION RESULTS
Fig.4.5 shows output waveforms of SIPF transmitter, where 2,5 are DIN
and TEN signal.10,11 are the DWIRE and DWIRE True and complement
output signal. It is observed that the Average power is 5.17E-05 and Predelay
is 1.68E-12. Here the proposed SIPF –CNTFET transmitter average power
and delay is reduced 10 times than the Existing CNTFET based transmitter.
In the above table shows that the predelay, average power and power
delay product(pdp) metrics comparison of the both MOSFET and CNTFET
based transmitter. The Results are analysed. And it shows that when
compared to MOSFET the CNTFET having the reduced predelay, average
power and pdp.
55
5.00E-03
4.50E-03
4.00E-03
3.50E-03
3.00E-03
2.50E-03
2.00E-03
1.50E-03
1.00E-03
5.00E-04
0.00E+00
In above Fig 4.9 shows that the average power of the CNTFET is
reduced than the average power of the MOSFET.
2.00E-13
1.80E-13
1.60E-13
1.40E-13
1.20E-13
1.00E-13
8.00E-14
6.00E-14
4.00E-14
2.00E-14
0.00E+00
In the above Fig 4.10 shows that the power delay product of the
CNTFET using both current mode and voltage mode is less than the
MOSFET. It shows that SIPF and STPF based CNTFET transmitter shows
better power delay product than the Existing CNTFET based transmitter.
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1.60E-10
1.40E-10
1.20E-10
1.00E-10
8.00E-11
6.00E-11
4.00E-11
2.00E-11
0.00E+00
In the above Fig 4.11 shows that the Predelay of the CNTFET is
reduced than the MOSFET based voltage mode and current mode transmitter.
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CHAPTER 5
REFERENCES
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