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1 Exe3 Sol

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Solutions to Chapter 3:

Exercise 3.1: Charge Carriers in Semiconductors


a) Insertion in Equation (3.3):
ΔWG 1.12 eV
− −
2 ⋅8.63⋅10 5 eV/K ⋅ (273.15 K +100 K)
ni = N 0 ⋅ e 2 ⋅ k ⋅T = 3 ⋅ 10 /cm ⋅ e
19 3
= 84 ⋅ 1010 /cm 3

b) Reason for the diffusion current is a concentration gradient of charge carriers; the process is supported
by the thermal lattice movement. Cause of the field current or drift current is an electrical field which
accelerates the charged particles. A stronger lattice movement reduces the mobility of the carriers and
therefore diminishes the field current.

Exercise 3.2: p-n Junction


a) Electrons diffuse due to the concentration gradient as a diffusion current from the n- into the p-doped
region and leave behind in the n-region positively charged donator atoms. As soon as the electrons arrive
in the p-region they fall into holes which results in the generation of fixed negative charges. Based on the
space charges an electric field comes into existence which pushes the electrons as a field current back
into the n-region. After a while a balance is built up between diffusion and field current and a space
charge region is established in the p-n junction.
b) See Figure 3.16.

ΔWG k ⋅ t N02 ΔWG N02


c) VD = − ⋅ ln = − VD ⋅ ln
q q ND ⋅ NA q ND ⋅ NA
(3 ⋅ 1019 /cm 3 ) 2
= 1.12 V − 0.026 V ⋅ ln = 0.865 V
5 ⋅ 1016 /cm 3 ⋅ 1018 /cm 3

Exercise 3.3: Light Absorption in Semiconductors


a) At a penetration depth x = xP the initial irradiance E1 is reduced to E1/e.
Thus:
! 1
E ( x = xP ) = E1 ⋅ e −α ⋅ x P = E1 / e = E1 ⋅ e −1 ⇒ − α ⋅ xP = −1 ⇒ xP =
α
b) With Equation (3.1) and (3.2):

h ⋅ c0 6.6 ⋅ 10 −34 Ws 2 ⋅ 3 ⋅ 108 m/s 3.536 ⋅ 10-19 Ws ⋅ q


WPh = = = 3.536 ⋅ 10-19 Ws = = 2.21 eV
λ 560 ⋅ 10 m
-9
1.6 ⋅ 10-19 As

c) Taken out of Figure 3.22:

c-Si: α(WPh = 2.21 eV) = 6⋅103/cm ⇒ XP = 1/α = 1.67 µm

a-Si: α(WPh = 2.21 eV) = 7⋅104/cm ⇒ XP = 1/α = 0.14 µm

K. Mertens Textbook PV Solutions to Exercises


Exercise 3.4: Anti-Reflection Films
2
n −n 
2
 1 − 4.6 
a) R =  1 2  =   = 0.413
 1
n + n 2   1 + 4.6 

Of the incident 500 W/m2 about 41.3 % are reflected, thus ER = 206.5 W/m2.

b) Optimum refractive index: nS = n1 ⋅ n2 = 1 ⋅ 4.6 = 2.145 ;


λ 600 nm
Optimum film thickness: d = = = 69.9 nm ≈ 70 nm
4 ⋅ nS 4 ⋅ 2.145

λ 600 nm
c) Film thickness: d = = = 75 nm
4 ⋅ nS 4 ⋅ 2.0
2 2
 n 2 −n ⋅n   2 2 − 1 ⋅ 4.6 
Remaining reflection factor: R =  S 2 1 2  =  2  = 0.487 % ≈ 0.49 %

 n + n ⋅n  + ⋅
 S 1 2   2 1 4 .6 

K. Mertens Textbook PV Solutions to Exercises

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