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    Principle of Photo Electron Spectros

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    Abdul Baasit
    Photoelectron spectroscopy uses photons to eject electrons from a sample surface. The ejected electrons are analyzed to determine their kinetic energy and escape depth from the surface. This technique has surface sensitivity due to the inelastic mean free path of electrons within the sample. Most of the signal comes from within 3 times the inelastic mean free path of the surface, which is typically a few nanometers. While the penetration depth of x-rays is on the micrometer scale, the surface sensitivity of XPS is restricted to the nanometer scale due to electron escape depth.

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    Principle of Photo Electron Spectros

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    Abdul Baasit
    201 views9 pages
    Photoelectron spectroscopy uses photons to eject electrons from a sample surface. The ejected electrons are analyzed to determine their kinetic energy and escape depth from the surface. This technique has surface sensitivity due to the inelastic mean free path of electrons within the sample. Most of the signal comes from within 3 times the inelastic mean free path of the surface, which is typically a few nanometers. While the penetration depth of x-rays is on the micrometer scale, the surface sensitivity of XPS is restricted to the nanometer scale due to electron escape depth.

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    Principle of Photo Electron Spectroscopy

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    Photoelectron spectroscopy uses photons to eject electrons from a sample surface. The ejected electrons are analyzed to determine their kinetic energy and escape depth from the surface. This technique has surface sensitivity due to the inelastic mean free path of electrons within the sample. Most of the signal comes from within 3 times the inelastic mean free path of the surface, which is typically a few nanometers. While the penetration depth of x-rays is on the micrometer scale, the surface sensitivity of XPS is restricted to the nanometer scale due to electron escape depth.

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    Download as PDF, TXT or read online from Scribd
    Download as pdf or txt
    201 views9 pages

    Principle of Photo Electron Spectros

    Uploaded by

    Abdul Baasit
    Photoelectron spectroscopy uses photons to eject electrons from a sample surface. The ejected electrons are analyzed to determine their kinetic energy and escape depth from the surface. This technique has surface sensitivity due to the inelastic mean free path of electrons within the sample. Most of the signal comes from within 3 times the inelastic mean free path of the surface, which is typically a few nanometers. While the penetration depth of x-rays is on the micrometer scale, the surface sensitivity of XPS is restricted to the nanometer scale due to electron escape depth.

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    of 9

    Photoelectron Spectroscopy --- Basics 1.1 Photoemission process (Ref. 3.1, P.

    43)
    When a sample surface is irradiated with photons of energy h, electrons are emitted from the sample surface. Figure 1.1.1 shows the essence of this photoemission process.

    Fig. 1.1.1 Photoemission process.

    This process was first reported by H.Hertz in 1887. The excitation source was a UV lamp. Nowadays, the excitation source can be X-ray or synchrotron radiation. In this module, we concentrate on the X-ray photoelectron spectroscopy. Reference: 3.1 J. C. Vickerman, Surface analysis the principal techniques, John Wiley & Sons (1997).
    Goto: Section 1.2 Surface Sensitivity of XPS or Section 1.3 History of photoelectron spectroscopy

    1.2 Surface Sensitivity of XPS (Ref. 3.1, P. 58-61)


    Photoelectron spectroscopy is a surface sensitive technique. Its surface sensitivity can be explained in terms of the inelastic mean free path of electrons, .

    Photoelectron Spectroscopy --- Basics


    Inelastic mean free path is defined as the distance traveled by an electron between successive inelastic collisions. When the energy of the electron is larger than 100 eV, the higher the kinetic energy of the electron the longer the inelastic mean free path.

    Fig. 1.2.1 Inelastic mean free path of electron at different energies. (M. P. Seah, and W. A. Dench, Surface and Interface analysis 1, 2 (1979).)

    When X-ray photons enter below a sample surface, photoelectrons (or photoinduced electrons) are produced. Some travel out from the surface without losing any energy. Some of them lose energy owing to inelastic collisions.

    Photoelectron Spectroscopy --- Basics

    Fig. 1.2.2 Electrons from the sample surface.

    Photoelectron Spectroscopy --- Basics


    It has been shown theoretically by a Monte Carlo simulation and proved 2 experimentally that the intensity of ejecting electrons through a medium with no energy loss will follow an exponential decay function, i.e.
    d x I (d ) = K exp 0 cos

    dx

    1 C. J. Powell, A. Jablonski, S. Tanuma and D. R. Penn, J. Electron Spectrosc. Relat. Phenom, 68, P.605 (1994). 2 D. F. Mitchell, K. B. Clark, J. A. Bardwell, W. N. Lennard, G. R. Massoumi and I. V. Mitchell, Surf. Interface Anal. 21, P.44 (1994). Fraction of signal from various depth in term of Equation Fraction of signal (assuming is 0) 0.63 x 1 from surface exp( )dx I ( ) 0 cos = x I ( ) 0 exp( cos )dx 2 0.86 x 2 from surface exp( )dx I (2 ) 0 cos = x I ( ) 0 exp( cos )dx 3 0.95 x 3 from surface exp( )dx I (3 ) 0 cos = x I ( ) 0 exp( cos )dx Depth Thus 95% of the photoelectron signals come from the surface region of 3 thick. (3 is about several tens of ). The remaining 5% of signals come from the deeper region. This explains the surface sensitivity of XPS. Activities on web: Visit http://www.lasurface.com/IMFP/Ag_IMFP_1.htm You can learn why XPS is a surface sensitive technique in this website. Also, try the program at http://www.lasurface.com/IMFP/Ag_IMFP_3.htm to calculate the inelastic mean free path. The site is created with the help of VG Scientific. Question: "The penetration depth of X-ray used in XPS is in the order of m, therefore the surface sensitivity of XPS is restricted to analysis in m level."

    Photoelectron Spectroscopy --- Basics


    Please comment upon the above statement. Is it true or false? Answer with appropriate argument based on the origin of the surface sensitivity of XPS in terms of the inelastic mean free path of electron, , and the exponential decay function of photoelectron from within the sample. Reference: 3.1 J. C. Vickerman, Surface analysis the principal techniques, John Wiley & Sons (1997).
    Goto: Section 1.3 History of photoelectron spectroscopy

    1.3 History of photoelectron spectroscopy (Ref. 3.1, P. 44-46)


    1.3.1. Photoemission in the Pre-Siegbahn period 1887: Heinrich Hertz published, "On an effect of UV light upon the electric discharge" (Sitzungsber d. Berl. Akad. d. Wiss., June 9, 1887). 1895: Discovery of X-rays by W.K. Rntgen. 1897: J.J. Thomson's cathode ray tube experiments for measuring e/m of electrons: a primitive electron spectrometer. 1905: Einstein equation for the photoelectric effect: eV0 = h .

    Fig. 1.3.1 Lenards apparatus for investigating the photoelectric effect.

    Photoelectron Spectroscopy --- Basics

    Fig. 1.3.2 The variation of the photoelectric current with voltage, for different intensities of light, A<B<C. 1907: Innes, a Ph.D. student, conducted research on: "....the velocity of the cathode particles emitted by various metals under the influence of Rntgen rays...." (Proc. Roy. Sec.. Ser. A 79, 442(1907)). A photographic plate was used to measure the deflection of photoelectrons in a magnetic field. 1918: First XPS paper by a Chinese(!) A Harvard University researcher, Mang-Fuh Hu, reported, "some preliminary results in a determination of the maximum emission velocity of the photoelectrons from metals at X-ray frequencies" (Phys. Rev. 11, 505(1918)). 1925: H. Robinson, a pioneer who devoted his entire research career to XPS, wrote that, "...an accurate knowledge of the energies associated with the different electronic orbits within the atoms is essential to the further development of the theory of atomic structure" (Proc. Roy. Sec., Ser. A, 104, 455(1923)).

    Reference: 3.1 J. C. Vickerman, Surface analysis the principal techniques, John Wiley & Sons (1997).
    Goto: Section 1.3.2 Developments in Quantum Mechanics in the Pre-Siegbahn period

    Photoelectron Spectroscopy --- Basics


    1.3.2 Developments of Quantum Mechanics in the Pre-Siegbahn period 1911: Rutherford backscattering experiment for probing atomic structures. 1913: Bohr's primitive atom model. 1925: Schrdinger's quantum mechanics.

    Fig. 1.3.3 Energy diagram of atomic hydrogen

    Photoelectron Spectroscopy --- Basics

    Fig. 1.3.4 Orbital wavefunction of Schrdinger's equation for a hydrogen atom Reference: 3.1 J. C. Vickerman, Surface analysis the principal techniques, John Wiley & Sons (1997).
    Goto: Section 1.3.2 Modern Photoemission Spectroscopy

    1.3.3 Modern Photoemission Spectroscopy 1950: R.G. Steinhardt Jr. published his PhD thesis, "An X-ray photoelectron spectrometer for chemical analysis" (Leihigh University). He was also the first to recognize that "X-ray photoelectron spectra are profoundly influenced by the chemical and physical nature of the surface under investigation" (Anal. Chem. 25, 697(1953)).

    Photoelectron Spectroscopy --- Basics


    1954: Kai Siegbahn built his high resolution photoelectron spectrometer, and subsequently established XPS as an important research and analysis tool. (Figure 3.2.2 from K. Siegbahn, C. Nordling, A. Fahlman, R. Nordberg, K. Hamrin, J. Hedman, G. Johnsson, T. Bergmark, S. E. Karlsson, I. Lindgren, and B. Lindberg, Nova Acta Regiae Soc. Sci. Ups. 20, 7 (1967).) In 1981: Kai M. Siegbahn was awarded the Nobel Prize for his contribution to the development of high-resolution electron spectroscopy. (Nobel Lectures in physics (1981-1990), World Scientific Publishing Co. Pte. Ltd 1993)

    Fig.1.3.5 Schematic diagram of the early X-ray source from B. Wannberg, U. Gelius, and K. Siegbahn, J. of Phys. E.Sci. Instrum. 7, 149-159 (1994). Reference: 3.1 J. C. Vickerman, Surface analysis the principal techniques, John Wiley & Sons (1997).
    Goto: Section 1.2 Surface Sensitivity of XPS

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