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Optical proximity correction (OPC) is a widely used technique to enhance the printability of designs in various foundaries. Recently, there has been a growing interest in using rigorous numerical optimization and machine learning to improve the robustness ...

Source mask optimization (SMO) is vital for mitigating lithography imaging distortions caused by shrinking critical dimensions in integrated circuit fabrication. However, the computational intensity of SMO, involving multiple integrals in Abbe’s ...

Resubstitution is a flexible algorithmic framework for circuit restructuring that has been incorporated into many high-effort logic optimization flows. It is thus important to speed up resubstitution in order to obtain high-quality realizations of large-...

Composite Current Source (CCS) timing model plays an important role in modern static timing analysis (STA) because it precisely captures the timing behavior of a design at advanced nodes. However, CCS is extremely time-consuming due to its accurate but ...

Layout pattern generation via deep generative models is a promising methodology for building practical large-scale pattern libraries. However, although improving optical proximity correction (OPC) is a major target of existing pattern generation methods, ...

Due to the lengthy design cycle, generating legal, diverse and valid layout patterns artificially to expand VLSI layout pattern libraries has become an important problem to solve in order to facilitate modern design-for-manufacturability (DFM) studies. ...

With minimal compromises on other metrics, eliminating overflow and lowering congestion level of global routing results as much as possible is a crucial topic for reducing violations and hotspots in subsequent design phases. Different from current common ...

Large-scale multi-FPGA prototyping platforms play an indispensable role in the functional verification of complex IC designs. The process of compiling circuit designs typically entails tasks such as partitioning, global placement and routing using a ...

Placement serves as a fundamental step in VLSI physical design. Recently, GPU-based placer DREAMPlace <xref ref-type="bibr" rid="ref1">[1]</xref> demonstrated its superiority over CPU-based placers. In this work, we develop an extremely fast GPU-...

The 2024 International Symposium on Physical Design lifetime achievement award goes to Professor Martin D F Wong for his oustanding contributions in the field.

Face-to-face (F2F) stacked 3D IC is a promising alternative for scaling beyond Moore's Law. In F2F 3D ICs, dies are connected through bonding terminals whose positions can significantly impact routing performance. Further, there exists resource ...

Inverse lithography technique (ILT) is one of the most widely used resolution enhancement techniques (RETs) to compensate for the diffraction effect in the lithography process. However, ILT suffers from runtime overhead issues with the shrinking size of ...

Microarchitecture determines the implementation of a microprocessor. Designing a microarchitecture to achieve better performance, power, and area (PPA) trade-off has been increasingly difficult. Previous data-driven methodologies hold inappropriate ...

The emerging technologies of 3D integrated circuits (3DICs) unveil a new avenue for expanding the design space into the 3D domain and present the opportunity to overcome the bottleneck of Moore's Law for the traditional 2DICs. Among various technologies, ...

Microarchitecture parameters tuning is critical in the microprocessor design cycle. It is a non-trivial design space exploration (DSE) problem due to the large solution space, cycle-accurate simulators’ modeling inaccuracy, and high simulation runtime for ...

Computational lithography provides algorithmic and mathematical support for resolution enhancement in optical lithography, which is critical for semiconductor manufacturing. The time-consuming lithography simulation and mask optimization processes limit ...

As a key routine in static timing analysis (STA), path-based analysis (PBA) plays a very important role in refining the critical path report by reducing excessive slack pessimism. PBA is also well known for its long execution time, which makes it a hot ...

Over the past few years, super-resolution (SR) processing has achieved astonishing progress along with the development of deep learning. Nevertheless, the rigorous requirement for real-time inference, especially for video tasks, leaves a harsh challenge ...

In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware ...

Modern very large-scale integration (VLSI) design requires the implementation of integrated circuits using electronic design automation (EDA) tools. Due to the complexity of EDA algorithms, there are numerous tool parameters that have imperative impacts ...