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Non-Uniform Temperature Distribution in Interconnects and Its Impact on Electromigration

Published: 13 May 2019 Publication History

Abstract

We investigate the effect of electrically induced thermal load on interconnect reliability and aging. We propose new models for uniform and non-uniform temperature evolution and its steady state distribution in interconnects considering Joule heating and heat convection. The models are verified by comparing the results against those of finite element experiments. We apply our models to study material migration induced aging and failures. We discuss how different non-uniform temperature profiles affect interconnect lifetime. We propose new formulas for accurate temperature aware assessment of the mortality of interconnects. We demonstrate that neglecting thermal effects in modern technologies may lead to incorrect conclusions about interconnect mortality. We also provide a method for modeling the true mean time to failure based on underlying physics.

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Cited By

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  • (2022)Fast Electromigration Stress Analysis Considering Spatial Joule Heating EffectsProceedings of the 27th Asia and South Pacific Design Automation Conference10.1109/ASP-DAC52403.2022.9712535(208-213)Online publication date: 17-Jan-2022
  • (2021)A Fast Semi-Analytic Approach for Combined Electromigration and Thermomigration Analysis for General Multisegment InterconnectsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2020.299427140:2(350-363)Online publication date: 1-Feb-2021
  • (2021)Temperature-Aware Electromigration Analysis with Current-Tracking in Power Grid NetworksJournal of Computer Science and Technology10.1007/s11390-021-0909-836:5(1133-1144)Online publication date: 1-Oct-2021
  • Show More Cited By

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Published In

cover image ACM Conferences
GLSVLSI '19: Proceedings of the 2019 Great Lakes Symposium on VLSI
May 2019
562 pages
ISBN:9781450362528
DOI:10.1145/3299874
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Publication History

Published: 13 May 2019

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Author Tags

  1. aging
  2. electromigration
  3. interconnect
  4. interconnects
  5. lifetime
  6. reliability
  7. stress migration
  8. thermomigration

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GLSVLSI '19
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GLSVLSI '19: Great Lakes Symposium on VLSI 2019
May 9 - 11, 2019
VA, Tysons Corner, USA

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Overall Acceptance Rate 312 of 1,156 submissions, 27%

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Great Lakes Symposium on VLSI 2025
June 30 - July 2, 2025
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Cited By

View all
  • (2022)Fast Electromigration Stress Analysis Considering Spatial Joule Heating EffectsProceedings of the 27th Asia and South Pacific Design Automation Conference10.1109/ASP-DAC52403.2022.9712535(208-213)Online publication date: 17-Jan-2022
  • (2021)A Fast Semi-Analytic Approach for Combined Electromigration and Thermomigration Analysis for General Multisegment InterconnectsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2020.299427140:2(350-363)Online publication date: 1-Feb-2021
  • (2021)Temperature-Aware Electromigration Analysis with Current-Tracking in Power Grid NetworksJournal of Computer Science and Technology10.1007/s11390-021-0909-836:5(1133-1144)Online publication date: 1-Oct-2021
  • (2020)Electromigration immortality check considering joule heating effect for multisegment wiresProceedings of the 39th International Conference on Computer-Aided Design10.1145/3400302.3415634(1-8)Online publication date: 2-Nov-2020

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