DFM: swimming upstream

Semiconductor yield has traditionally been limited by random particle-defect based issues. However, as the feature sizes reduced to 0.13 micron and below, systematic mechanism- limited yield loss began to appear as a substantial component in yield loss. ...

As VLSI technology pushes into advanced nodes, designers and foundries have exposed a hitherto insignificant set of yield problems. To combat yield failures, the semiconductor industry has deployed new tools and methodologies commonly referred to as ...

Until the move to the 130nm node, yield was an issue only for product engineers and engineers on the production line. Design engineers did not need to think explicitly about yield, or understand the manufacturing process. Beginning at the 130nm node, ...