research-article

Self-aligned double patterning aware pin access and standard cell layout co-optimization

Authors:

David Z. PanAuthors Info & Claims

ISPD '14: Proceedings of the 2014 on International symposium on physical design

Pages 101 - 108

https://doi.org/10.1145/2560519.2560530

Published: 30 March 2014 Publication History

Abstract

Self-Aligned Double Patterning (SADP) is being considered for use at the 10$nm$ technology node and below for routing layers with pitches down to ~50nm because it has better LER and overlay control compared to other multiple patterning candidates. To date, most of the SADP-related literature has focused on enabling SADP-legal routing in physical design tools while few attempts have been made to address the impact SADP routing has on local, standard cell (SC) I/O pin access. In this paper, we present the first study on SADP-aware pin access and layout optimization at the SC level. Accounting for SADP-specific design rules, we propose a coherent framework that uses Mixed Integer Linear Programming (MILP) and branch and bound method to simultaneously optimize SADP-based local pin access and within-cell connections. Our experimental results show that, compared with the conventional approach, our framework effectively improves pin access of the standard cells and maximizes the pin access flexibility for routing.

References

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Cited By

Abazyan SMelikyan VMelikyan S(2022)Standard Cell Full Abutment Check Method2022 IEEE 41st International Conference on Electronics and Nanotechnology (ELNANO)10.1109/ELNANO54667.2022.9926993(47-50)Online publication date: 10-Oct-2022
https://doi.org/10.1109/ELNANO54667.2022.9926993
Yu TFang SChiu HHu KTai PShen CSheng H(2021)Pin Accessibility Prediction and Optimization With Deep-Learning-Based Pin Pattern RecognitionIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2020.304007840:11(2345-2356)Online publication date: Nov-2021
https://doi.org/10.1109/TCAD.2020.3040078
Yu TFang SChiu HHu KTai PShen CSheng H(2019)Pin Accessibility Prediction and Optimization with Deep Learning-based Pin Pattern RecognitionProceedings of the 56th Annual Design Automation Conference 201910.1145/3316781.3317882(1-6)Online publication date: 2-Jun-2019
https://dl.acm.org/doi/10.1145/3316781.3317882
Show More Cited By

Index Terms

Self-aligned double patterning aware pin access and standard cell layout co-optimization
1. Hardware
  1. Electronic design automation
    1. Physical design (EDA)
      1. Partitioning and floorplanning

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Published In

cover image ACM Conferences

ISPD '14: Proceedings of the 2014 on International symposium on physical design

March 2014

180 pages

ISBN:9781450325929

DOI:10.1145/2560519

General Chair:
Cliff Sze
IBM Research
,
Program Chair:
Azadeh Davoodi
University of Wisconsin - Madison

Copyright © 2014 ACM.

Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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SIGDA: ACM Special Interest Group on Design Automation

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Association for Computing Machinery

New York, NY, United States

Publication History

Published: 30 March 2014

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ISPD'14

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SIGDA

ISPD'14: International Symposium on Physical Design

March 30 - April 2, 2014

California, Petaluma, USA

Acceptance Rates

ISPD '14 Paper Acceptance Rate 14 of 40 submissions, 35%;

Overall Acceptance Rate 62 of 172 submissions, 36%

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ISPD '25

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sigda

International Symposium on Physical Design

March 16 - 19, 2025

Austin , TX , USA

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Cited By

Abazyan SMelikyan VMelikyan S(2022)Standard Cell Full Abutment Check Method2022 IEEE 41st International Conference on Electronics and Nanotechnology (ELNANO)10.1109/ELNANO54667.2022.9926993(47-50)Online publication date: 10-Oct-2022
https://doi.org/10.1109/ELNANO54667.2022.9926993
Yu TFang SChiu HHu KTai PShen CSheng H(2021)Pin Accessibility Prediction and Optimization With Deep-Learning-Based Pin Pattern RecognitionIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2020.304007840:11(2345-2356)Online publication date: Nov-2021
https://doi.org/10.1109/TCAD.2020.3040078
Yu TFang SChiu HHu KTai PShen CSheng H(2019)Pin Accessibility Prediction and Optimization with Deep Learning-based Pin Pattern RecognitionProceedings of the 56th Annual Design Automation Conference 201910.1145/3316781.3317882(1-6)Online publication date: 2-Jun-2019
https://dl.acm.org/doi/10.1145/3316781.3317882
Ryzhenko NBurns SSorokin ATalalay MBustany ISwartz W(2019)Pin Access-Driven Design Rule Clean and DFM Optimized Routing of Standard Cells under Boolean ConstraintsProceedings of the 2019 International Symposium on Physical Design10.1145/3299902.3309744(41-47)Online publication date: 4-Apr-2019
https://dl.acm.org/doi/10.1145/3299902.3309744
Ding YChu CMak W(2018)Self-Aligned Double Patterning-Aware Detailed Routing With Double Via Insertion and Via Manufacturability ConsiderationIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2017.271266037:3(657-668)Online publication date: Mar-2018
https://doi.org/10.1109/TCAD.2017.2712660
Xu XPan D(2017)Toward Unidirectional Routing Closure in Advanced Technology NodesIPSJ Transactions on System LSI Design Methodology10.2197/ipsjtsldm.10.210(2-12)Online publication date: 2017
https://doi.org/10.2197/ipsjtsldm.10.2
Ding YChu CMak WOzdal MChu C(2017)Pin Accessibility-Driven Detailed Placement RefinementProceedings of the 2017 ACM on International Symposium on Physical Design10.1145/3036669.3036679(133-140)Online publication date: 19-Mar-2017
https://dl.acm.org/doi/10.1145/3036669.3036679
Xu XLin YLi MOu JCline BPan D(2017)Redundant Local-Loop Insertion for Unidirectional RoutingIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2017.265181136:7(1113-1125)Online publication date: Jul-2017
https://doi.org/10.1109/TCAD.2017.2651811
Ding YChu CMak W(2017)Self-Aligned Double Patterning Lithography Aware Detailed Routing With Color PreassignmentIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2016.262262536:8(1381-1394)Online publication date: Aug-2017
https://doi.org/10.1109/TCAD.2016.2622625
Fang STai CLin R(2017)On Benchmarking Pin Access for Nanotechnology Standard Cells2017 IEEE Computer Society Annual Symposium on VLSI (ISVLSI)10.1109/ISVLSI.2017.49(237-242)Online publication date: Jul-2017
https://doi.org/10.1109/ISVLSI.2017.49
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