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Sub-Resolution Assist Feature Generation with Reinforcement Learning and Transfer Learning

Published: 22 December 2022 Publication History

Abstract

As modern photolithography feature sizes continue to shrink, sub-resolution assist feature (SRAF) generation has become a key resolution enhancement technique to improve the manufacturing process window. State-of-the-art works resort to machine learning to overcome the deficiencies of model-based and rule-based approaches. Nevertheless, these machine learning-based methods do not consider or implicitly consider the optical interference between SRAFs, and highly rely on post-processing to satisfy SRAF mask manufacturing rules. In this paper, we are the first to generate SRAFs using reinforcement learning to address SRAF interference and produce mask-rule-compliant results directly. In this way, our two-phase learning enables us to emulate the style of model-based SRAFs while further improving the process variation (PV) band. A state alignment and action transformation mechanism is proposed to achieve orientation equivariance while expediting the training process. We also propose a transfer learning framework, allowing SRAF generation under different light sources without retraining the model. Compared with state-of-the-art works, our method improves the solution quality in terms of PV band and edge placement error (EPE) while reducing the overall runtime.

References

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      cover image ACM Conferences
      ICCAD '22: Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design
      October 2022
      1467 pages
      ISBN:9781450392174
      DOI:10.1145/3508352
      Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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      • IEEE-EDS: Electronic Devices Society
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      Publication History

      Published: 22 December 2022

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      Author Tags

      1. Markov decision process
      2. design for manufacturability
      3. reinforcement learning
      4. sub-resolution assist feature
      5. transfer learning

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      • Synopsys, Inc.
      • Taiwan National Science Foundation and Technology Council

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      ICCAD '22
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      ICCAD '22: IEEE/ACM International Conference on Computer-Aided Design
      October 30 - November 3, 2022
      California, San Diego

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      Overall Acceptance Rate 457 of 1,762 submissions, 26%

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